Chromium titanium nitride films with different content of Cr and Ti were deposited on a
silicon substrate by ion beam assisted deposition and characterised by Rutherford …

A dual ion beam system is used to produce hard nanocomposite TiN/Si3N4 coatings on Si.
Cross-sectional high resolution transmission electron microscopy analysis of the coatings …

Transmission electron microscopy (TEM) has been used to study the effects of implanted
oxygen or carbon on the dynamics of cavity growth in silicon. The cavities are produced by …

Nanosized voids in semiconductors have been found have a number of potential
applications in device engineering. 1, 2 The possible use of voids to getter trace impurities in …

It is challenging to prepare a good sample for high-resolution electron microscopy of
polycrystalline ceramic powders containing hard particles or particles with a strong …

Transmission electron microscopy (TEM) is a powerful method to resolve the microscopic
structure of functional materials. Due to the high resolving capability and the strong …

The properties of nanoscale materials have been shown to deviate from those expected of
bulk materials. In order to better understand the causes of these observations, a …