Plasma processing of low-k dielectrics
This paper presents an in-depth overview of the present status and novel developments in
the field of plasma processing of low dielectric constant (low-k) materials developed for …
the field of plasma processing of low dielectric constant (low-k) materials developed for …
Low-temperature plasma processing for Si photovoltaics
SQ Xiao, S Xu, K Ostrikov - Materials Science and Engineering: R: Reports, 2014 - Elsevier
There has been a recent rapid expansion of the range of applications of low-temperature
plasma processing in Si-based photovoltaic (PV) technologies. The desire to produce Si …
plasma processing in Si-based photovoltaic (PV) technologies. The desire to produce Si …
Multi-diagnostic experimental validation of 1d3v PIC/MCC simulations of low pressure capacitive RF plasmas operated in argon
The particle-in-cell/Monte Carlo collisions (PIC/MCC) simulation approach has become a
standard and well-established tool in studies of capacitively coupled radio frequency (RF) …
standard and well-established tool in studies of capacitively coupled radio frequency (RF) …
Modeling electromagnetic effects in capacitive discharges
I Lee, DB Graves, MA Lieberman - Plasma Sources Science and …, 2008 - iopscience.iop.org
We present a self-consistent two-dimensional axisymmetric model and simulation strategy to
predict radial plasma uniformity in large-area high-frequency (up to 200 MHz) capacitive …
predict radial plasma uniformity in large-area high-frequency (up to 200 MHz) capacitive …
2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms
The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …
Surface effects in a capacitive argon discharge in the intermediate pressure regime
JT Gudmundsson, J Krek, DQ Wen… - Plasma Sources …, 2022 - iopscience.iop.org
One-dimensional particle-in-cell/Monte Carlo collisional simulations are performed on a
capacitive 2.54 cm gap, 1.6 Torr argon discharge driven by a sinusoidal rf current density …
capacitive 2.54 cm gap, 1.6 Torr argon discharge driven by a sinusoidal rf current density …
Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges
OV Proshina, TV Rakhimova, AI Zotovich… - Plasma Sources …, 2017 - iopscience.iop.org
Low-pressure RF plasma in fluorohydrocarbon gas mixtures is widely used in modern
microelectronics, eg in the etching of materials with a low dielectric constant (low-k) …
microelectronics, eg in the etching of materials with a low dielectric constant (low-k) …
2D particle-in-cell simulations of charged particle dynamics in geometrically asymmetric low pressure capacitive RF plasmas
Understanding the spatio-temporal dynamics of charged particles in low pressure radio
frequency capacitively coupled plasmas (CCP) is the basis for knowledge based process …
frequency capacitively coupled plasmas (CCP) is the basis for knowledge based process …
Plasma transport under neutral gas depletion conditions
L Liard, JL Raimbault, JM Rax… - Journal of Physics D …, 2007 - iopscience.iop.org
It was previously shown that plasma transport is enhanced by neutral gas depletion when
the plasma pressure is not negligible compared with the neutral gas pressure …
the plasma pressure is not negligible compared with the neutral gas pressure …
Experimental and theoretical study of ion energy distribution function in single and dual frequency RF discharges
TV Rakhimova, OV Braginsky, VV Ivanov… - IEEE transactions on …, 2007 - ieeexplore.ieee.org
Ion energy distribution functions (IEDFs) at the electrodes in single frequency (SF) and dual
frequency (DF) radio-frequency discharges in Ar at pressures of 20 and 45 mtorr are …
frequency (DF) radio-frequency discharges in Ar at pressures of 20 and 45 mtorr are …