In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Abstract NbN and Nb 1-x Al x N thin films with various Al contents, with x ranging from 0.10
to 0.60, were deposited by magnetron sputtering of Nb and Al targets in an Ar/N 2 …

The antibacterial Cu-bearing 304L stainless steel is a new kind of structural and functional
integrated metal material. In this work, evolution behavior of passive film of different heat …

Cu-bearing stainless steel (SS) with excellent broad-spectrum antibacterial property while
maintaining the original mechanical properties of SS may quite be a more advantageous …

ZrN coatings, modified by Ti+ Si additions, were obtained by reactively co-sputtering
elemental Zr and a TiSi alloy (29%-at Si). The TiSi alloy target was sputtered at a fixed …

This paper presents the synergy of the effect of two surface engineering technologies—
magnetron sputtering (MS-PVD) and atomic layer deposition (ALD) on the structure and …

Hard and wear-resistant conductors (HWCs) have important applications in the next-
generation sliding electrical contacts. However, Cu-and Pt-based alloys, two commonly …

Higher temperatures and longer treatment times are necessary in a conventional thermal
treatment method, which restricts the substrate materials and treatment efficiency. In this …

Titanium nitride (TiN) is a unique refractory plasmonic material, the nanocomposites and
alloys of which provide further opportunities to tailor its optical and photonic properties. We …

Аннотация Актуальной является разработка тонкопленочных терморегулирующих
покрытий для малых космических аппаратов. Покрытия на основе нитрида титана, в …