Recent progress on optical tomographic technology for measurements and inspections of film structures

KN Joo, HM Park - Micromachines, 2022 - mdpi.com
In this review, we present the recent progress on film metrology focused on the advanced
and novel technologies during the last two decades. This review consists of various …

Optics of inhomogeneous thin films with defects: Application to optical characterization

I Ohlídal, J Vohánka, M Čermák - Coatings, 2020 - mdpi.com
This review paper is devoted to optics of inhomogeneous thin films exhibiting defects
consisting in transition layers, overlayers, thickness nonuniformity, boundary roughness and …

Review and Novel Formulae for Transmittance and Reflectance of Wedged Thin Films on absorbing Substrates

M Ballester, EJ Marquez, J Bass… - Measurement …, 2024 - iopscience.iop.org
Historically, spectroscopic techniques have been essential for studying the optical properties
of thin solid films. However, existing formulae for both normal transmission and reflection …

Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers

I Ohlídal, J Vohánka, V Buršíková, D Franta… - Optics express, 2019 - opg.optica.org
In this paper the complete optical characterization of an inhomogeneous polymer-like thin
film of SiO x C y H z exhibiting a thickness non-uniformity and transition layer at the …

[HTML][HTML] Determination of Optical and Structural Parameters of Thin Films with Differently Rough Boundaries

I Ohlídal, J Vohánka, J Dvořák, V Buršíková, P Klapetek - Coatings, 2024 - mdpi.com
The optical characterization of non-absorbing, homogeneous, isotropic polymer-like thin
films with correlated, differently rough boundaries is essential in optimizing their …

Optical method for determining the power spectral density function of randomly rough surfaces by simultaneous processing of spectroscopic reflectometry, variable …

J Vohánka, V Šulc, I Ohlídal, M Ohlídal, P Klapetek - Optik, 2023 - Elsevier
Two samples of silicon-single crystal substrates with randomly rough surfaces covered by
native oxide layers are investigated by means of angle-resolved scattering, spectroscopic …

Fast analysis of film thickness in spectroscopic reflectometry using direct phase extraction

K Kim, S Kwon, HJ Pahk - Current Optics and Photonics, 2017 - opg.optica.org
A method for analysis of thin film thickness in spectroscopic reflectometry is proposed. In
spectroscopic reflectometry, there has been a trade-off between accuracy and computation …

Improved measurement of thin film thickness in spectroscopic reflectometer using convolutional neural networks

MG Kim - International Journal of Precision Engineering and …, 2020 - Springer
This research introduces a novel method of ensuring more reliable measurement of thin film
thickness in spectroscopic reflectometer. Nonlinear fitting is the method most commonly …

Volumetric thin film thickness measurement using spectroscopic imaging reflectometer and compensation of reflectance modeling error

K Kim, S Kim, S Kwon, HJ Pahk - International Journal of Precision …, 2014 - Springer
In this paper, volumetric thin film thickness is measured using the spectroscopic imaging
reflectometer, which consists of a microscopy optic system, variable bandpass filter and …

Optical characterization of inhomogeneity of polymer-like thin films arising in the initial phase of plasma-enhanced chemical vapor deposition

J Dvořák, J Vohánka, V Buršíková, I Ohlídal - Heliyon, 2024 - cell.com
In this study, an optical investigation in a wide spectral range of polymer-like (SiO x C y H z)
thin films deposited by plasma-enhanced chemical vapor deposition (PECVD) is presented …