Highly etch selective amorphous carbon film
R Prasad, S Bobek, PK Kulshreshtha, KD Lee… - US Patent …, 2024 - Google Patents
Methods and techniques for deposition of amorphous carbon films on a substrate are
provided. In one example, the method includes depositing an amorphous carbon film on an …
provided. In one example, the method includes depositing an amorphous carbon film on an …
Highly etch selective amorphous carbon film
R Prasad, S Bobek, PK Kulshreshtha… - US Patent App. 17 …, 2023 - Google Patents
2023-01-20 Assigned to APPLIED MATERIALS INC. reassignment APPLIED MATERIALS
INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS) …
INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS) …
Line-end extension method and device
C Hsiao, CW Lai, RG Liu, CM Lai, SM Chang… - US Patent …, 2024 - Google Patents
Methods of forming line-end extensions and devices having line-end extensions are
provided. In some embodiments, a method includes forming a patterned photoresist on a …
provided. In some embodiments, a method includes forming a patterned photoresist on a …