Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and
recently it has been successfully applied to nanolithography due to its ability of beyond …

Plasmonic lithography has received extensive attention as both a potential candidate for
next generation lithography and as an interesting testbed to test the fundamental resolution …

Optical metrics relating to metallic absorption in representative plasmonic systems are
surveyed, with a view to developing heuristics for optimizing performance over a range of …

We report on the fabrication of two types of adjustable, near-field superlens designs: metal–
dielectric composites and metal–dielectric multilayer films. We fabricated a variety of films …

We investigate the imaging properties of copper-based superlens surrounded by copper
oxide (Cu 2 O). A subwavelength image resolution of the order λ/9 is demonstrated …

The use of transfer-matrix analyses for characterizing planar optical superlensing systems is
studied here, and the simple model of the planar superlens as an isolated imaging element …

We characterize the sensitivity of imaging properties of a layered silver-TiO 2 flat lens to
fabrication inaccuracies. The lens is designed for approximately diffraction-free imaging with …

Silver lenses having super-resolution are analyzed in terms of antisymmetric modes of
surface plasmon which have the ability to amplify evanescent waves in UV region …

The state of the art for plasmonic lithography and the phenomenon of forbidden pitch are
introduced. Combined with the Optical transfer function (OTF) characteristic curve of the …

Based on plasmonic lithography (PL) technology, and aiming at the special nano-optical
effect of metal/dielectric multilayer composites and mask three-dimensional (M3D) effect, a …