Ultra-low-threshold continuous-wave and pulsed lasing in tensile-strained GeSn alloys

A Elbaz, D Buca, N von den Driesch, K Pantzas… - Nature …, 2020 - nature.com
Strained GeSn alloys are promising for realizing light emitters based entirely on group IV
elements. Here, we report GeSn microdisk lasers encapsulated with a SiN x stressor layer to …

Site-controlled and advanced epitaxial Ge/Si quantum dots: Fabrication, properties, and applications

M Brehm, M Grydlik - Nanotechnology, 2017 - iopscience.iop.org
In this review, we report on fabrication paths, challenges, and emerging solutions to
integrate group-IV epitaxial quantum dots (QDs) as active light emitters into the existing …

GeSn lasers covering a wide wavelength range thanks to uniaxial tensile strain

J Chrétien, N Pauc, F Armand Pilon, M Bertrand… - Acs …, 2019 - ACS Publications
Silicon photonics continues to progress tremendously, both in near-infrared
datacom/telecoms and in mid-IR optical sensing, despite the fact a monolithically integrated …

Low-threshold optically pumped lasing in highly strained germanium nanowires

S Bao, D Kim, C Onwukaeme, S Gupta… - Nature …, 2017 - nature.com
The integration of efficient, miniaturized group IV lasers into CMOS architecture holds the
key to the realization of fully functional photonic-integrated circuits. Despite several years of …

Reduced lasing thresholds in GeSn microdisk cavities with defect management of the optically active region

A Elbaz, R Arefin, E Sakat, B Wang, E Herth… - ACS …, 2020 - ACS Publications
GeSn alloys are nowadays considered as the most promising materials to build Group IV
laser sources on silicon (Si) in a full complementary metal oxide semiconductor-compatible …

GeSnOI mid-infrared laser technology

B Wang, E Sakat, E Herth, M Gromovyi… - Light: Science & …, 2021 - nature.com
GeSn alloys are promising materials for CMOS-compatible mid-infrared lasers
manufacturing. Indeed, Sn alloying and tensile strain can transform them into direct bandgap …

Strain engineering 2D MoS2 with thin film stress capping layers

T Peña, SA Chowdhury, A Azizimanesh, A Sewaket… - 2D …, 2021 - iopscience.iop.org
We demonstrate a method to induce tensile and compressive strain into two-dimensional
transition metal dichalcogenide (TMDC) MoS 2 via the deposition of stressed thin films to …

Lasing in Group-IV materials

V Reboud, D Buca, H Sigg, JM Hartmann… - Silicon Photonics IV …, 2021 - Springer
Silicon photonics in the near-IR, up to 1.6 µm, is already one of key technologies in optical
data communications, particularly short range. It also is being prospected for applications in …

Germanium based photonic components toward a full silicon/germanium photonic platform

V Reboud, A Gassenq, JM Hartmann, J Widiez… - Progress in Crystal …, 2017 - Elsevier
Lately, germanium based materials attract a lot of interest as they can overcome some limits
inherent to standard Silicon Photonics devices and can be used notably in Mid-Infra-Red …

Impact of tensile strain on low Sn content GeSn lasing

D Rainko, Z Ikonic, A Elbaz, N von den Driesch… - Scientific reports, 2019 - nature.com
In recent years much effort has been made to increase the Sn content in GeSn alloys in
order to increase direct bandgap charge carrier recombination and, therefore, to reach room …