An ion-beam deposition system has been used to fabricate Mo-Si multilayer coatings for
masks and imaging optics to be used for extreme-ultraviolet lithography. In addition to high …

Background: Repeated exposure of extreme ultraviolet (EUV) masks to UV radiation
exacerbates the thermal deformation of the constituent materials. In particular, for systems …

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Thermal and structural deformation of extreme-ultraviolet lithography (EUVL) masks during
the exposure process may become important issues as these masks are subject to rigorous …

Mo–Si multilayer structures were grown by ion-beam and magnetron sputtering to make
high-performance mask blanks for practical use in extreme-ultraviolet (EUV) lithography. For …

Here we present a development of multilayer-based optics for the extreme ultra-violet (EUV)
and x-ray range. The authors discuss results of the study of optical performance of Mo/Si …

The aim of our work is to investigate deposition conditions to further optimize the reflectivity
of Mo/Si multilayers (MLs) for reflective coatings of extreme ultraviolet mask blanks. Dark …

Ion beam sputtering and magnetron sputtering were used to grow Mo-Si multilayer
structures to investigate which is more suitable for the fabrication of mask blanks for extreme …

Extreme ultraviolet lithography (EUVL) uses reflective optics due to the high absorption of
EUV sources, and EUV masks consist of multiple layers of composites to increase …

This thesis describes the development and characterization of high thermal and radiation
stable Si-based multilayer mirrors for their application in extreme ultraviolet lithographic …