Tuning the electronic and mechanical properties of penta-graphene via hydrogenation and fluorination

X Li, S Zhang, FQ Wang, Y Guo, J Liu… - Physical Chemistry …, 2016 - pubs.rsc.org
Penta-graphene has recently been proposed as a new allotrope of carbon composed of
pure pentagons, and displays many novel properties going beyond graphene [Zhang et al …

Ultra-thin silicate films on metals

S Shaikhutdinov, HJ Freund - Journal of Physics: Condensed …, 2015 - iopscience.iop.org
Silica is one of the key materials in many modern technological applications.'Surface
science'approach for understanding surface chemistry on silica-based materials, on the one …

Si–SiO2 interface band‐gap transition – effects on MOS inversion layer

S Markov, PV Sushko, S Roy, C Fiegna… - … status solidi (a), 2008 - Wiley Online Library
Density functional theory simulation results of the atomic structure at the Si–SiO 2 interface
implies a non-abrupt transition of the band-gap within the oxide. The depth of the transition …

Transition metal induced crystallization of ultrathin silica films

L Li, H Tissot, S Shaikhutdinov… - Chemistry of Materials, 2017 - ACS Publications
Silica (SiO2) is one of the key materials in many modern technological applications
including microelectronics, catalysis, and photonics. 1− 4 As an ultrathin film grown on metal …

Determination of tunnel mass and physical thickness of gate oxide including poly-Si/SiO/sub 2/and Si/SiO/sub 2/interfacial transition Layers

H Watanabe, D Matsushita… - IEEE transactions on …, 2006 - ieeexplore.ieee.org
By including poly-Si/SiO/sub 2/and Si/SiO/sub 2/interfacial transition (IFT) layers, an
excellent agreement in terms of both CV and JV characteristics is obtained between the …

Chemical structure of interfacial transition layer formed on Si (100) and its dependence on oxidation temperature, annealing in forming gas, and difference in oxidizing …

T Suwa, A Teramoto, Y Kumagai, K Abe… - Japanese Journal of …, 2013 - iopscience.iop.org
The angle-resolved Si 2p photoelectron spectra arising from a interfacial transition layer
formed on a Si (100) were measured with a probing depth of nearly 2 nm. The novel …

Study of the gate insulator/silicon interface utilizing soft and hard x-ray photoelectron spectroscopy at SPring-8

T Hattori, H Nohira, K Azuma, KW Sakai… - … journal of high speed …, 2006 - World Scientific
The chemical structures of SiO 2/Si interfaces were studied by photoelectron spectroscopy
using high-brilliance soft X-ray with photon energy ranging from 500 to 1500 eV at Super …

X-ray photoelectron spectroscopy study of dielectric constant for Si compounds

K Hirose, M Kihara, D Kobayashi, H Okamoto… - Applied physics …, 2006 - pubs.aip.org
The authors measure the difference of core-level binding energy shifts for Si 1 s and Si 2 p⁠,
Δ E 1 s-Δ E 2 p⁠, for various Si compounds using high-resolution high-energy synchrotron …

Determination of electron escape depth in ultrathin silicon oxide

H Nohira, H Okamoto, K Azuma, Y Nakata… - Applied Physics …, 2005 - pubs.aip.org
Using the high-brilliance synchrotron radiation at SPring-8, we determined the electron
escape depths in approximately 1‐nm-thick low-temperature oxide layers, which were …

Universal Tunnel Mass and Charge Trapping in Film

H Watanabe, D Matsushita… - IEEE transactions on …, 2010 - ieeexplore.ieee.org
Although the tunnel mass is indispensable to predict the gate leakage current of electron
devices, it has been regarded as an adjustable parameter to fit the calculated leakage …