The term 3D IC generally means an IC package having multiple device layers, which is
different with 3D transistor structures such as the FinFET. 3D packaging and 3D integration …

The article provides a review of the current state of affairs in the field of physics and
technology of multilayer beryllium-containing mirrors intended for projection lithography and …

The primary requirement for the development of tools for extreme ultraviolet lithography
(EUVL) has been the identification and optimization of suitable sources. These sources must …

We demonstrate a table-top broadband emission water window source based on laser-
produced high-Z plasmas. Resonance emission from multiply charged ions merges to …

We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ= 6.7 nm by
optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd …

We characterize extreme ultraviolet (EUV) emission from mid-infrared (mid-IR) laser-
produced plasmas (LPPs) of the rare-earth element Gd. The energy conversion efficiency …

We have demonstrated an efficient extreme ultraviolet (EUV) source at 6.7 nm by irradiating
Gd targets with 0.8 and 1.06 μm laser pulses of 140 fs to 10 ns duration. Maximum …

We have prepared various low-density Gd targets to investigate the effect of concentration
on the extreme ultraviolet (EUV) radiation near 6.7 ánm and out-of-band emission from laser …

We present the experimental investigations of extreme ultraviolet (EUV) radiation of laser-
produced plasma based on the micro-structured Gd target and obtain a strong EUV radiation …

Measurements of extreme ultraviolet radiation from highly charged gadolinium ions were
made at the National Institute of Standards and Technology. The ions were produced and …