Metallic materials deposition: metal‐organic precursors
CH Winter, TJ Knisley, LC Kalutarage… - … of Inorganic and …, 2011 - Wiley Online Library
This review describes metal‐organic precursors for the growth of metal‐containing thin films
by chemical vapor deposition (CVD)‐based methods. The major emphasis is on precursors …
by chemical vapor deposition (CVD)‐based methods. The major emphasis is on precursors …
[PDF][PDF] Electrical properties of semiconducting copper zinc sulphide thin films
The electrical properties of metal-organic-chemical-vapour-deposited copper zinc sulphide
(Cu-Zn-S) thin films on soda-lime substrates were studied. The films produced were …
(Cu-Zn-S) thin films on soda-lime substrates were studied. The films produced were …
Tribological behavior of N-doped ZnO thin films by metal organic chemical vapor deposition under lubricated contacts
N-doped ZnO thin films were deposited on 304L stainless steel through the pyrolysis of zinc
acetate and ammonium acetate in different ratios at a temperature of 420° C using metal …
acetate and ammonium acetate in different ratios at a temperature of 420° C using metal …
[PDF][PDF] Preparation and physical properties of CuxZn1-xS thin films deposited by metal organic chemical vapour deposition technique
ABSTRACT Copper Zinc Sulphide (CuxZn1-xS) thin films were prepared and deposited
using metal organic chemical vapour deposition (MOCVD) technique. The films were …
using metal organic chemical vapour deposition (MOCVD) technique. The films were …
[PDF][PDF] Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Lithium Chromium Oxide Thin Films
GO Egharevba, MA Eleruja, O Osasona… - Journal of Materials …, 2012 - Citeseer
Abstract Thin Films of Lithium Chromium Oxide were deposited on soda lime glass
substrates at a temperature of 420 C by the pyrolysis of a mixture of Lithium Hydroxide and …
substrates at a temperature of 420 C by the pyrolysis of a mixture of Lithium Hydroxide and …
[PDF][PDF] A detailed study on preparation and some physical properties of CuxZn1-xS thin films deposited by metal organic chemical vapour deposition technique
ABSTRACT Copper Zinc Sulphide (CuxZn1-xS) thin films were prepared and deposited
using metal organic chemical vapour deposition (MOCVD) technique. The films were …
using metal organic chemical vapour deposition (MOCVD) technique. The films were …
[PDF][PDF] PREPARATION AND CHARACTERIZATION OF METAL ORGANIC CHEMICAL VAPOUR DEPOSITED COPPER ZINC SULPHIDE THIN FILMS USING SINGLE …
B OLOFINJANA, MA ELERUJA, SO AZI - ejmse.ro
Metal organic chemical vapour deposition (MOCVD) was used with a mixed single solid
source precursors of copper dithiocarbamate (CuC10H16N2O2S4) and zinc …
source precursors of copper dithiocarbamate (CuC10H16N2O2S4) and zinc …