Improving the performance of aqueous zinc‐ion batteries by inhibiting zinc dendrite growth: recent progress

VC Ho, H Lim, MJ Kim, J Mun - Chemistry–An Asian Journal, 2022 - Wiley Online Library
Aqueous zinc‐ion batteries (ZIBs) are promising candidates for the next‐generation high‐
energy storage devices, owing to their resource availability, low cost, eco‐friendliness, and …

5-Amino-1, 3, 4-thiadiazole-2-thiol as a new leveler for blind holes copper electroplating: Theoretical calculation and electrochemical studies

M Zhou, Y Meng, J Ling, Y Zhang, W Huang, Y Min… - Applied Surface …, 2022 - Elsevier
High density interconnection printed circuit board PCB puts forward high requirements for
defect free blind holes copper filling. Here, 5-amino-1, 3, 4-thiadiazole-2-mercaptan, a small …

Structural influence of nitrogen-containing groups on triphenylmethane-based levelers in super-conformal copper electroplating

Z Li, B Tan, J Luo, J Qin, G Yang, C Cui, L Pan - Electrochimica Acta, 2022 - Elsevier
Leveler is one of the most important additives for super-conformal copper electroplating,
which has been widely applied in the fabrication of nanoscale (or microscale) interconnect …

Experimental and theoretical study of the new leveler basic blue 1 during copper superconformal growth

Y Li, C Li, R Li, X Peng, J Zhang, P Yang… - … applied materials & …, 2023 - ACS Publications
A novel chlorinated functional group-modified triphenylmethane derivative leveler BB1 is
used to achieve superconformal electrodeposition in microvias. Cyclic voltammetry (CV) and …

Competitive adsorption between bromide ions and bis (3-sulfopropyl)-disulfide for Cu microvia filling

MH Lee, MJ Kim, JJ Kim - Electrochimica Acta, 2021 - Elsevier
A three–additive combination of an accelerator, a polymeric suppressor, and an organic
leveler is typically utilized in the electrodeposition process to achieve Cu bottom–up filling of …

Molecular structure impacts of tetrazole derivatives on their diffusion and adsorption behaviors for microvia copper void-free filling

JQ Yang, JP Qiu, L Jin, ZY Wang, T Song, Y Zhao… - Surfaces and …, 2024 - Elsevier
Optimizing a high-quality leveler has become the core task in developing the microvia
copper filling technology. In this work, two nitrogen-containing heterocyclic compounds …

Bis-(sodium sulfoethyl)-disulfide: a promising accelerator for super-conformal copper electrodeposition with wide operating concentration ranges

Z Li, B Tan, M Shi, J Luo, Z Hao, J He… - Journal of the …, 2020 - iopscience.iop.org
Accelerators are indispensable additives for super-conformal copper electrodeposition,
which has been widely applied in the fabrication of integrated circuits (ICs), printed circuit …

[HTML][HTML] Study of ion transportation and electrodeposition under hybrid agitation for electroforming of variable aspect ratios micro structures

H Zhang, N Zhang, F Fang - Precision Engineering, 2021 - Elsevier
Microstructural replication accuracy in precision micro electroforming process is related to
ions transportation inside the micro structure and microstructural feature width and aspect …

Structure Performance Correlation of N-Heterocyclic Oligomer Leveler for Acid Copper Plating of Advanced Interconnects

C Peng, Y Zhai, X Chen, C Wang, Y Hong, Y Chen… - Molecules, 2023 - mdpi.com
Levelers, as an essential part of organic additives in copper electroplating, play a crucial
role in the fabrication of sophisticated interconnects in integrated circuits, packaging …

Quaternary ammonium-based levelers for high-speed microvia filling via Cu electrodeposition

MH Lee, Y Lee, JA Kim, Y Jeon, MJ Kim, YG Kim… - Electrochimica …, 2022 - Elsevier
Shortening the Cu gap-filling time at microvias by electrodeposition is critical for increasing
the productivity of printed circuit board (PCB) fabrication. Additives that can facilitate …