Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
2020-11-07 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors …
Sequential infiltration synthesis apparatus
IJ Raaijmakers, JW Maes, W Knaepen… - US Patent …, 2023 - Google Patents
2017-02-28 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
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Sequential infiltration synthesis apparatus and a method of forming a patterned structure
JW Maes, W Knaepen, KK Kachel… - US Patent …, 2022 - Google Patents
A sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and
arranged to hold at least a first substrate; a precursor distribution and removal system to …
arranged to hold at least a first substrate; a precursor distribution and removal system to …
Layer forming method and apparatus
A Klaver, W Knaepen, L Jdira, G Van Der Star… - US Patent …, 2023 - Google Patents
There is provided a method and apparatus for forming a layer, by sequentially repeating a
layer deposition cycle to process a substrate disposed in a reaction chamber. The …
layer deposition cycle to process a substrate disposed in a reaction chamber. The …
Thin film forming method
Y Kim, Y Kim - US Patent 12,025,484, 2024 - Google Patents
A thin film forming method includes: a first operation of supplying a source gas at a first flow
rate into a reactor; a second operation of purging the source gas in the reactor to an exhaust …
rate into a reactor; a second operation of purging the source gas in the reactor to an exhaust …
Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
EJ Shero, RB Milligan, WG Petro, E Wang… - US Patent …, 2022 - Google Patents
2022-03-29 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
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Substrate processing method and device manufactured by using the same
YK Min - US Patent 11,361,990, 2022 - Google Patents
Provided are a substrate processing method and a device manufactured by using the same,
which may improve etch selectivity of an insulating layer deposited on a stepped structure …
which may improve etch selectivity of an insulating layer deposited on a stepped structure …
Substrate processing system
YK Min, Y Kim, H Lee, SJ Chun - US Patent 11,530,483, 2022 - Google Patents
2019-08-30 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
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Thin film deposition method
KC Um, JH Han, DH Kim, Y Han, TH Yoo… - US Patent …, 2022 - Google Patents
2020-01-26 Assigned to ASM IP HOLDING BV reassignment ASM IP HOLDING BV
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Semiconductor processing apparatus and a method for processing a substrate
P Raisanen, D Marquardt, T Aswad - US Patent 11,473,195, 2022 - Google Patents
C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL;
CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; …
CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; …