Characteristics of ALD‐ZnO Thin Film Transistor Using H2O and H2O2 as Oxygen Sources
ZnO thin films are deposited by atomic layer deposition (ALD) using diethylzinc as the Zn
source and H2O and H2O2 as oxygen sources. The oxidant‐and temperature‐dependent …
source and H2O and H2O2 as oxygen sources. The oxidant‐and temperature‐dependent …
Introducing a Robust Flexible Conductive Hybrid: Indium Oxide-ParyleneC Obtained by Vapor Phase Infiltration
Hybrid materials are a merger of inorganic and organic materials and, as such, have the
potential to outperform the characteristics and functionalities of conventional, that is …
potential to outperform the characteristics and functionalities of conventional, that is …
Low‐Temperature Atomic Layer Deposition of High‐k SbOx for Thin Film Transistors
SbOx thin films are deposited by atomic layer deposition (ALD) using SbCl5 and Sb (NMe2)
3 as antimony reactants and H2O and H2O2 as oxidizers at low temperatures. SbCl5 can …
3 as antimony reactants and H2O and H2O2 as oxidizers at low temperatures. SbCl5 can …
Entropy‐Driven Self‐Healing of Metal Oxides Assisted by Polymer–Inorganic Hybrid Materials
Enabling self‐healing of materials is crucially important for saving resources and energy in
numerous emerging applications. While strategies for the self‐healing of polymers are …
numerous emerging applications. While strategies for the self‐healing of polymers are …
Modified auto-combustion synthesis of mixed-oxides TiO2/NiO nanoparticles: Physical properties and photocatalytic performance
Abstract TiO 2/NiO 50: 50 wt% mixed-oxide nanopowders were successfully synthesized by
a modified combustion based process. The effects of the synthesis condition, ie the pH of the …
a modified combustion based process. The effects of the synthesis condition, ie the pH of the …
Effect of different oxygen precursors on alumina deposited using a spatial atomic layer deposition system for thin-film encapsulation of perovskite solar cells
An atmospheric-pressure spatial atomic layer deposition system operated in atmospheric-
pressure spatial chemical vapor deposition conditions is employed to deposit alumina (AlO …
pressure spatial chemical vapor deposition conditions is employed to deposit alumina (AlO …
ZnO thin films with stable, tunable electrical and optical properties deposited by atomic layer deposition using Et2Zn: NEtMe2 precursor
MJ Jung, D Kim, HC Kim, S Kim, Y Kim, SH Kwon… - Applied Surface …, 2025 - Elsevier
ZnO thin films were deposited via atomic layer deposition (ALD), using Zn precursor,
DEZDMEA (Et 2 Zn: NEtMe 2) and H 2 O as a reactant. The design of DEZDMEA aimed to …
DEZDMEA (Et 2 Zn: NEtMe 2) and H 2 O as a reactant. The design of DEZDMEA aimed to …
Low temperature (002)-oriented zinc oxide films prepared using ozone-based spatial atomic layer deposition
WB Wu, CH Hsu, XX Yue, WZ Zhang, J Zhang… - Ceramics …, 2024 - Elsevier
In this study, ZnO films are prepared at a low temperature of 150° C by using spatial atomic
layer deposition (sALD) with diethylzinc and ozone as precursor and oxidant. The ozone …
layer deposition (sALD) with diethylzinc and ozone as precursor and oxidant. The ozone …
Effect of ZnO and SnO2 Nanolayers at Grain Boundaries on Thermoelectric Properties of Polycrystalline Skutterudites
Nanostructuring is considered one of the key approaches to achieve highly efficient
thermoelectric alloys by reducing thermal conductivity. In this study, we investigated the …
thermoelectric alloys by reducing thermal conductivity. In this study, we investigated the …
Synthesis of Synergistic Ni(OH)2@ZnO Core–Shell Nanostructured Electrodes by a Hydrothermal Method and Atomic Layer Deposition for High‐Performance …
A novel nanoporous Ni (OH) 2@ ZnO core–shell architecture is successfully synthesized via
a hydrothermal reaction and atomic layer deposition (ALD). This hybrid material exhibited a …
a hydrothermal reaction and atomic layer deposition (ALD). This hybrid material exhibited a …