Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic
devices for computing and data storage, but also for emerging technologies such as related …

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

Lithium metal anodes can largely enhance the energy density of rechargeable batteries
because of the high theoretical capacity and the high negative potential. However, the …

Sequential infiltration synthesis (SIS) is an emerging materials growth method by which
inorganic metal oxides are nucleated and grown within the free volume of polymers in …

Presently, photoelectrochemical (PEC) water splitting is the most promising way to generate
hydrogen in a clean and sustainable manner. However, enormous challenges need to be …

Here, we introduce polymer of intrinsic microporosity 1 (PIM-1) to design single-layer and
multilayered all-inorganic antireflective coatings (ARCs) with excellent mechanical …

Recent advances in the physical vapor deposition (PVD) of protective fluoride films have
raised the far-ultraviolet (FUV: 912–1600 Å) reflectivity of aluminum-based mirrors closer to …

Atomic layer deposition (ALD) enables the deposition of numerous materials in thin film
form, yet there are no ALD processes for metal iodides. Herein, we demonstrate an ALD …

With the increasing demand for energy at a low cost and minimal environmental impact, the
development of next‐generation high‐performance batteries has drawn considerable …

Atomic layer etching (ALE) of Al2O3, HfO2, and ZrO2 was accomplished using sequential
exposures with hydrogen fluoride (HF) as the fluorination reagent and dimethylaluminum …