Solution based CVD of main group materials
CE Knapp, CJ Carmalt - Chemical Society Reviews, 2016 - pubs.rsc.org
This critical review focuses on the solution based chemical vapour deposition (CVD) of main
group materials with particular emphasis on their current and potential applications …
group materials with particular emphasis on their current and potential applications …
Vapor-phase production of nanomaterials
M Malekzadeh, MT Swihart - Chemical Society Reviews, 2021 - pubs.rsc.org
The synthesis of nanomaterials, with characteristic dimensions of 1 to 100 nm, is a key
component of nanotechnology. Vapor-phase synthesis of nanomaterials has numerous …
component of nanotechnology. Vapor-phase synthesis of nanomaterials has numerous …
Principles of precursor design for vapour deposition methods
Chemical vapour deposition (CVD) and atomic layer deposition (ALD) are attractive
techniques for depositing a wide spectrum of thin solid film materials, for a broad spectrum of …
techniques for depositing a wide spectrum of thin solid film materials, for a broad spectrum of …
Recent advances in processing and applications of Heterobimetallic oxide thin films by aerosol‐assisted chemical vapor deposition
The fabrication of smart, efficient, and innovative devices critically needs highly refined thin‐
film nanomaterials; therefore, facile, scalable, and economical methods of thin films …
film nanomaterials; therefore, facile, scalable, and economical methods of thin films …
Mono-and Bimetallic Aluminum Alkyl, Alkoxide, Halide and Hydride Complexes of a Bulky Conjugated Bis-Guanidinate (CBG) Ligand and Aluminum Alkyls as …
T Peddarao, N Sarkar, S Nembenna - Inorganic chemistry, 2020 - ACS Publications
Tetra-aryl-substituted symmetrical conjugated bis-guanidine (CBG) ligands such as L1–3
(3H)[L (3H)={(ArHN)(ArHN) C═ N–C═ NAr (NHAr)}; Ar= 2, 6-Me2-C6H3 (L1 (3H)), 2, 6-Et2 …
(3H)[L (3H)={(ArHN)(ArHN) C═ N–C═ NAr (NHAr)}; Ar= 2, 6-Me2-C6H3 (L1 (3H)), 2, 6-Et2 …
Recent developments in molecular precursors for atomic layer deposition
AL Johnson, JD Parish - 2018 - books.rsc.org
One field of organometallic and materials chemistry that has seen great advancements over
the last 20 years is that of atomic layer deposition (ALD), and in particular the development …
the last 20 years is that of atomic layer deposition (ALD), and in particular the development …
Guanidinates as Alternative Ligands for Organometallic Complexes
F Carrillo-Hermosilla, R Fernández-Galán, A Ramos… - Molecules, 2022 - mdpi.com
For decades, ligands such as phosphanes or cyclopentadienyl ring derivatives have
dominated Coordination and Organometallic Chemistry. At the same time, alternative …
dominated Coordination and Organometallic Chemistry. At the same time, alternative …
Synthesis of copper (I) cyclic (alkyl)(amino) carbene complexes with potentially bidentate N^ N, N^ S and S^ S ligands for efficient white photoluminescence
AS Romanov, F Chotard, J Rashid… - Dalton Transactions, 2019 - pubs.rsc.org
The reaction of (Me2L) CuCl with either NaS2CX [X= OEt, NEt2 or carbazolate (Cz)] or with
1, 3-diarylguanidine, 1, 3-diarylformamidine or thioacetaniline in the presence of KOtBu …
1, 3-diarylguanidine, 1, 3-diarylformamidine or thioacetaniline in the presence of KOtBu …
Atomic Layer Deposition of Nanocrystalline-As-Deposited (GeTe)x(Sb2Te3)1–x Films for Endurable Phase Change Memory
This paper introduces a new atomic layer deposition process for highly conformal,
nanocrystalline-as-deposited GeTe–Sb2Te3 pseudobinary film growth at a deposition …
nanocrystalline-as-deposited GeTe–Sb2Te3 pseudobinary film growth at a deposition …
Developing precursor chemistry for atomic layer deposition of high-density, conformal GeTe films for phase-change memory
Atomic layer deposition (ALD) of phase-change materials has been suggested as the most
feasible technique for the construction of high-aspect-ratio architectures required for …
feasible technique for the construction of high-aspect-ratio architectures required for …