High-k erbium oxide film prepared by sol-gel method for low-voltage thin-film transistor

G Wang, D Liu, S Fan, Z Li, J Su - Nanotechnology, 2021 - iopscience.iop.org
In this work, high-dielectric-constant (high-k) erbium oxide (Er 2 O 3) film is fabricated using
the spin coating method, and annealed at a series of temperatures (from 400 C to 700 C) …

Flexible and stretchable inorganic solar cells: Progress, challenges, and opportunities

N El-Atab, MM Hussain - MRS Energy & Sustainability, 2020 - cambridge.org
This review focuses on state-of-the-art research and development in the areas of flexible
and stretchable inorganic solar cells, explains the principles behind the main technologies …

Enhanced Aramid/Al2O3 interfacial properties by PDDA modification for the preparation of composite insulating paper

F Lv, X Lu, J Song, M Zhu, S Wang, Y Xu… - Research on Chemical …, 2022 - Springer
To further improve the electrical insulation properties of meta-aramid paper,
polydimethyldiallyl ammonium chloride (PDDA) was used for the modification of nano-Al2O3 …

ZrO 2 atomic layer deposition into Sr 0.5 Sm 0.5 CoO 3− δ–Ce 0.9 Gd 0.1 O 2− δ solid oxide fuel cell cathodes: mechanisms of stability enhancement

TA Schmauss, JG Railsback, MY Lu, KY Zhao… - Journal of Materials …, 2019 - pubs.rsc.org
The application of atomic layer deposition (ALD) on solid oxide fuel cell (SOFC) cathodes
has previously yielded mixed results and has been seen to depend on the ALD species …

Nano-scale transistors for interfacing with brain: design criteria, progress and prospect

N El-Atab, SF Shaikh, MM Hussain - Nanotechnology, 2019 - iopscience.iop.org
Abstract According to the World Health Organization, one quarter of the world's population
suffers from various neurological disorders ranging from depression to Alzheimer's disease …

Atomic layer-deposited Ta 2 O 5− x nano-islands for charge trapping memory devices

S Sun, L Gao, P Han, L Zhu, WM Li… - Journal of Materials …, 2024 - pubs.rsc.org
Charge trapping memory (CTM) boasts numerous advantages over conventional flash
memory, making it a suitable alternative. In this work, atomic layer-deposited Ta2O5− x nano …

Sub-1 nm Equivalent Oxide Thickness Al-HfO2 Trapping Layer with Excellent Thermal Stability and Retention for Nonvolatile Memory

S Spiga, F Driussi, G Congedo, C Wiemer… - ACS Applied Nano …, 2018 - ACS Publications
Memory stacks for charge trapping cells have been produced exploiting Al-doped HfO2,
Al2O3, and SiO2 made by atomic layer deposition. The fabricated stacks show superior …

Nanoislands-based charge trapping memory: a scalability study

N El-Atab, I Saadat, K Saraswat… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
Zinc-oxide (ZnO) and zirconia (ZrO 2) metal oxides have been studied extensively in the
past few decades with several potential applications including memory devices. In this work …

Methanol templated synthesis of ordered lamellar superstructured zirconia and its outstanding hierarchical thermostabilities

Q Chen, C Liu, X Ji, C Liu, Y Zhao, Z Fang - Ceramics International, 2019 - Elsevier
Ordered lamellar superstructured zirconia (OLSZ) was successfully synthesized via a reflux-
hydrothermal method. ZrOCl 2, NaOH and methanol were used as zirconium source …

Correlation between memory characteristics and energy band bending resulted from composition distribution of trapping layer for charge trap memory

Z Tang, R Li, X Zhang, H Geng, S Zang… - Semiconductor …, 2018 - iopscience.iop.org
Charge trap memory devices with Zr x Si 1–x O 2 films as charge trapping layer consisting of
nine [(ZrO 2) m (SiO 2) n (ZrO 2) m (SiO 2) n] units have been fabricated and investigated …