Reliability of NAND flash memories: Planar cells and emerging issues in 3D devices

AS Spinelli, C Monzio Compagnoni, AL Lacaita - Computers, 2017 - mdpi.com
We review the state-of-the-art in the understanding of planar NAND Flash memory reliability
and discuss how the recent move to three-dimensional (3D) devices has affected this field …

Random telegraph noise in 3D NAND flash memories

AS Spinelli, G Malavena, AL Lacaita… - Micromachines, 2021 - mdpi.com
In this paper, we review the phenomenology of random telegraph noise (RTN) in 3D NAND
Flash arrays. The main features of such arrays resulting from their mainstream integration …

3D semicircular flash memory cell: Novel split-gate technology to boost bit density

M Fujiwara, T Morooka, S Nagashima… - 2019 IEEE …, 2019 - ieeexplore.ieee.org
Three-dimensional (3D) semicircular split-gate flash memory cells have been successfully
developed for the first time. Reduction of fringing field effects is essential to extract maximum …

Interfacial delamination at multilayer thin films in semiconductor devices

JH Kim, HJ Kil, S Lee, J Park, JW Park - Acs Omega, 2022 - ACS Publications
With the evolution of semiconducting industries, thermomechanical failure induced in a
multilayered structure with a high aspect ratio during manufacturing and operation has …

Origin of incremental step pulse programming (ISPP) slope degradation in charge trap nitride based multi-layer 3D NAND flash

K Nam, C Park, JS Yoon, H Jang, MS Park, J Sim… - Solid-State …, 2021 - Elsevier
Abstract We analyzed Incremental Step Pulse Programming (ISPP) slope degradation to
improve the program efficiency of 3D NAND Flash memory using both measurement and …

Characterization and modeling of temperature effects in 3-D NAND Flash arrays—Part II: Random telegraph noise

G Nicosia, A Mannara, D Resnati… - … on Electron Devices, 2018 - ieeexplore.ieee.org
This paper investigates the temperature dependence of random telegraph noise (RTN) in 3-
D NAND Flash technologies. Experimental results on memory arrays reveal an increase of …

Modeling the Impact of Random Grain Boundary Traps on the Electrical Behavior of Vertical Gate 3-D NAND Flash Memory Devices

YH Hsiao, HT Lue, WC Chen, KP Chang… - … on Electron Devices, 2014 - ieeexplore.ieee.org
The 3-D stacking of multiple layers of NAND using thin-film transistor (TFT) devices is widely
accepted as the next step in continuing NAND Flash scaling. Low mobility and reliability …

Improved Hopfield network optimization using manufacturable three-terminal electronic synapses

SI Yi, S Kumar, RS Williams - IEEE Transactions on Circuits and …, 2021 - ieeexplore.ieee.org
We illustrate novel optimization techniques via simulations for Hopfield networks constructed
from manufacturable three-terminal Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) synaptic …

The effects of taper-angle on the electrical characteristics of vertical NAND flash memories

KT Kim, SW An, HS Jung, KH Yoo… - IEEE Electron Device …, 2017 - ieeexplore.ieee.org
The effects of taper angle of the string and the number of layers on the electrical
characteristics of vertical NAND flash memories are investigated. Simulation results show …

A semi-analytical model for macaroni MOSFETs with application to vertical Flash memories

GM Paolucci, AS Spinelli… - … on Electron Devices, 2016 - ieeexplore.ieee.org
We present a semianalytical model for the electrostatics and the current-voltage
characteristics of Macaroni MOSFETs based on the exact solution of the Poisson equation …