Silicon is an attractive semiconductor material for wide‐ranging applications, from
electronics and sensing to solar cells. Functionalization of H‐terminated silicon surfaces with …

The continuous miniaturization in the semiconductor industry brings electronic devices with
higher performance at lower cost. The doping of semiconductor materials plays a crucial role …

The growing interest in nanoelectronics and photonics, combined with the development of
new germanium-based devices, provide the impetus to develop new doping methods …

Monolayer doping (MLD) of silicon substrates at the nanoscale is a powerful method to
provide controlled doses of dopants and defect-free materials. However, this approach …

An effective bottom-up technology for precisely controlling the amount of dopant atoms
tethered on silicon substrates is presented. Polystyrene and poly (methyl methacrylate) …

An effective doping technology for the precise control of P atom injection and activation into
a semiconductor substrate is presented. Polystyrene polymers with a narrow molecular …

Achieving the required control of dopant distribution and selectivity for nanostructured
semiconducting building block is a key issue for a large variety of applications. A promising …

Advanced doping technologies are key for the continued scaling of semiconductor devices
and the maintenance of device performance beyond the 14 nm technology node. Due to …

Ultrashallow doping is required for both classical field-effect transistors in integrated circuits
and revolutionary quantum devices in quantum computing. In this review, we give a brief …

In this article, the functionalization of planar silicon with arsenic-and phosphorus-based
azides was investigated. Covalently bonded and well-ordered alkyne-terminated …