Justification of the most rational method for the nanostructures synthesis on the semiconductors surface

Y Suchikova, S Vambol, V Vambol… - … of Achievements in …, 2019 - journalamme.org
Purpose: of this paper is to justification the most rational method for the nanostructures
synthesis on the semiconductors surface, which is capable of providing high quality …

[PDF][PDF] Using High Voltage Electrochemical Oxidation (HVEO) to obtain protective coatings, surface finishing on electronic materials.

D Nmadu, NC Eli-Chukwu, UU Uma… - Digest Journal of …, 2022 - academia.edu
Electronics industry is one of the fastest growing industries with seemingly inexhaustible
possibilities of new applications. Printed circuit boards (PCB), capacitors, CPU heat sinks …

FORMATION OF WEAR-RESISTANT ANODIC OXIDE FILMS ON SILICON ALUMINUM ALLOY FOR ELECTRICAL AND ELECTRONIC MATERIALS

D Nmadu, E Stepanova-Parshuto… - … Quarterly of High …, 2023 - dl.begellhouse.com
The composition of electrolytes for the formation of wear-resistant oxide layers on the silicon
aluminum alloy by the method of high-voltage electrochemical oxidation is developed …