[HTML][HTML] HfO2-based ferroelectric thin film and memory device applications in the post-Moore era: A review

J Liao, S Dai, RC Peng, J Yang, B Zeng, M Liao… - Fundamental …, 2023 - Elsevier
The rapid development of 5G, big data, and Internet of Things (IoT) technologies is urgently
required for novel non-volatile memory devices with low power consumption, fast read/write …

Fluorite-structured antiferroelectric hafnium-zirconium oxide for emerging nonvolatile memory and neuromorphic-computing applications

K Xu, T Wang, J Yu, Y Liu, Z Li, C Lu, J Song… - Applied Physics …, 2024 - pubs.aip.org
The rapid progress of the internet of things, cloud computing, and artificial intelligence has
increased demand for high-performance computing. This demand has led to a focused …

ZrO2-HfO2 Superlattice Ferroelectric Capacitors With Optimized Annealing to Achieve Extremely High Polarization Stability

YK Liang, WL Li, YJ Wang, LC Peng… - IEEE Electron …, 2022 - ieeexplore.ieee.org
The ferroelectric polarization stability and dielectric characteristics of ZrO 2-HfO 2
superlattice (SL) ferroelectric layer Metal-Ferroelectric-Metal (MFM) capacitor fabricated with …

Effects of annealing conditions on structural and ferroelectric properties of CeO2-HfO2 solid solution thin films on InAs substrates fabricated by chemical solution …

S Zheng, C Jing, Z Liu, P Hao, Q Yang, B Zeng… - Journal of Alloys and …, 2023 - Elsevier
CeO 2-HfO 2 solid solution thin films are fabricated on (100) InAs substrates by chemical
solution deposition (CSD) method. The effects of annealing conditions (annealing …

Recent advances in the mechanism, properties, and applications of hafnia ferroelectric tunnel junctions

E Lim, D Kim, J Park, M Koo, S Kim - Journal of Physics D …, 2024 - iopscience.iop.org
The increasing demand of information and communication technology has pushed
conventional computing paradigm to its limit. In addition, physical and technological factors …

Large–Area Graphene Electrode for Ferroelectric Control of Pb(Mg1/3Nb2/3)O3–PbTiO3 Single Crystal

G Lee, M Jung, Y Yun, H Kang, N Park… - Advanced Electronic …, 2023 - Wiley Online Library
Large‐area monolayer graphene is utilized as a metallic electrode for a ferroelectric single‐
crystal [Pb (Mg1/3Nb2/3) O3] m–[PbTiO3] n (PMNPT). Unlike conventional metal, whose …

Effect of temperature on polaronic transport in CeO2 thin-film

M Paul, S Karmakar, S Tripathi, SN Jha… - The Journal of …, 2024 - pubs.aip.org
The outstanding catalytic property of cerium oxide (CeO 2) strongly depends on the polaron
formation due to the oxygen vacancy (V ̈ O) defect and Ce 4+ to Ce 3+ transformation …

Improving the ferroelectric properties of Lu doped Hf0. 5Zr0. 5O2 thin films by capping a CeO x layer

Y Xiao, L Yang, Y Jiang, S Liu, G Li, J Ouyang… - …, 2024 - iopscience.iop.org
Abstract Lu doped Hf 0.5 Zr 0.5 O 2 (HZO) ferroelectric films were prepared on Pt/TiN/SiO
2/Si substrate by chemical solution deposition method, and an interfacial engineering …

Direct growth and interface reactions of ferroelectric Hf0. 5Zr0. 5O2 films on MoS2

M Leem, D Eom, H Lee, K Park, K Jeong, H Kim - Applied Surface Science, 2023 - Elsevier
The integration of ferroelectric HfO 2 films into two-dimensional layered-material-based
devices is expected to provide significant functionality for future electronics. In this study, Hf …

Future materials for beyond Si integrated circuits: a Perspective

L Colombo, S El Kazzi, M Popovici… - … on Materials for …, 2024 - ieeexplore.ieee.org
The integration of novel materials has been pivotal in advancing Si-based devices ever
since Si became the preferred material for transistors, and later, integrated circuits. New …