Atomic spectrometry update–X-ray fluorescence spectrometry
M West, AT Ellis, PJ Potts, C Streli, C Vanhoof… - Journal of Analytical …, 2010 - pubs.rsc.org
This comprehensive review covers the latest published activities using XRF techniques. X-
ray analytical equipment continues to be integrated with X-ray emission/diffraction …
ray analytical equipment continues to be integrated with X-ray emission/diffraction …
Bonding structure of phenylacetylene on hydrogen-terminated Si (111) and Si (100): surface photoelectron spectroscopy analysis and ab initio calculations
M Kondo, TE Mates, DA Fischer, F Wudl, EJ Kramer - Langmuir, 2010 - ACS Publications
Interfaces between phenylacetylene (PA) monolayers and two silicon surfaces, Si (111) and
Si (100), are probed by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron …
Si (100), are probed by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron …
Direct method for imaging elemental distribution profiles with long-period x-ray standing waves
A model-independent Fourier-inversion method for imaging elemental profiles from
multilayer and total-external reflection x-ray standing wave (XSW) data is developed for the …
multilayer and total-external reflection x-ray standing wave (XSW) data is developed for the …
Building conjugated organic structures on Si (111) surfaces via microwave-assisted sonogashira coupling
A novel step-by-step method employing microwave-assisted Sonogashira coupling is
developed to grow fully conjugated organosilicon structures. As the first case study, p-(4 …
developed to grow fully conjugated organosilicon structures. As the first case study, p-(4 …
Formation of Organic Monolayers Through Wet Chemistry
D Aureau, YJ Chabal - Functionalization of Semiconductor …, 2012 - Wiley Online Library
Wet chemical cleaning has always been an intrinsic part of semiconductor processing [1, 2],
but only relatively recently has wet chemistry been used to modify semiconductor surfaces …
but only relatively recently has wet chemistry been used to modify semiconductor surfaces …
Characterization of Semiconductor Surfaces during Surface Conditioning and Functionalization
Semiconductor surface cleaning, passivation and functionalization are critical steps for
applications such as microelectronics, MEMS, sensors, and solar energy harvesting …
applications such as microelectronics, MEMS, sensors, and solar energy harvesting …
Atomic-scale studies of the self-assembly of pi-conjugated molecules on silicon surfaces
JCP Lin - 2009 - search.proquest.com
A variety of surface-sensitive characterization tools together with density functional theory
(DFT) modeling have been applied to study the atomic-scale structures of the self-assembly …
(DFT) modeling have been applied to study the atomic-scale structures of the self-assembly …
Method of X-ray standing waves for diagnostic of surface and nanolayers of condensed matter
VV Lider - Inorganic Materials, 2014 - Springer
Method of X Ray Standing Waves for Diagnostic of Surface and Nanolayers of Condensed
Matter (Review) Page 1 ISSN 0020 1685, Inorganic Materials, 2014, Vol. 50, No. 15, pp …
Matter (Review) Page 1 ISSN 0020 1685, Inorganic Materials, 2014, Vol. 50, No. 15, pp …
X-ray studies of ion adsorption at charged titania-electrolyte interfaces
V Kohli - 2009 - search.proquest.com
Interaction of counter ions with charged solid-electrolyte interfaces plays an important role in
wide ranging chemical and environmental processes including ion adsorption, colloidal …
wide ranging chemical and environmental processes including ion adsorption, colloidal …
[引用][C] Метод стоячих рентгеновских волн для диагностики поверхности и нанослоев конденсированных сред (обзор)
ВВ Лидер - Заводская лаборатория. Диагностика материалов, 2013 - elibrary.ru
Описан метод стоячей рентгеновской волны—структурно-чувствительная
спектроскопия поверхности конденсированных сред и тонких пленок. Рассмотрены …
спектроскопия поверхности конденсированных сред и тонких пленок. Рассмотрены …