To overcome the diffraction constraints of traditional optical lithography, the next generation
lithographies (NGLs) will utilize any one or more of EUV (extreme ultraviolet), X-ray, electron …

Proton beam (p-beam) writing is a new direct-writing process that uses a focused beam of
MeV protons to pattern resist material at nanodimensions. The process, although similar in …

Small SU-8 ridge optical waveguides with an air cladding and a SiO _2 buffer on Si
substrate have been realized by using a direct ultraviolet (UV) photolithography technology …

Mesoscale imperfections, such as pores and voids, can strongly modify the properties and
the mechanical response of materials under extreme conditions. Tracking the material …

We proposed a new type of dihedral corner reflector array (DCRA) called “radially arranged
DCRA”. Our radially arranged DCRA could display a floating, three-dimensional image with …

Phonon polaritons (PhPs) provide new prospects for the development of next generation
nanophotonic devices due to the high optical confinement, low optical losses, and long …

We report about design, fabrication and properties of flexible polymer optical planar
waveguides made of epoxy novolak resin as planar waveguides deposited on various foil …

A new direct write 3D nano lithographic technique has been developed at the Centre for Ion
Beam Applications (CIBA) in the Physics Department of the National University of …

Signal amplification at the polymer optical fiber low-loss window of 650 nm is reported in an
SU8 rib waveguide coated with Rhodamine-640 doped poly (methyl methacrylate). A signal …

In this paper, we propose a novel vertical SU-8 waveguide for evanescent analyte sensing.
The waveguide is designed to possess a vertical and narrow structure to generate …