High-performance photoreceivers based on vertical-illumination type Ge-on-Si photodetectors operating up to 43 Gb/s at λ~ 1550nm

IG Kim, KS Jang, J Joo, S Kim, S Kim, KS Choi… - Optics …, 2013 - opg.optica.org
We present high-sensitivity photoreceivers based on a vertical-illumination-type 100% Ge-
on-Si pin photodetectors (PDs), which operate up to 50 Gb/s with high responsivity. A …

NDR-effect vertical-illumination-type Ge-on-Si avalanche photodetector

G Kim, S Kim, SA Kim, JH Oh, KS Jang - Optics Letters, 2018 - opg.optica.org
We present the enhanced performances of a vertical-illumination-type Ge-on-Si avalanche
photodetector based on internal RF-gain effects operating up to 50 Gb/s. A fabricated Ge-on …

Theoretical analysis of direct transition in SiGeSn/GeSn strain balanced QWIP

P Pareek, MK Das - Optical and Quantum Electronics, 2016 - Springer
This work presents a theoretical analysis of direct transition in strain balanced SiGeSn/GeSn
quantum well infrared photodetector. Eigen energies for Г valley conduction band, heavy …

Strong quantum-confined Stark effect from light hole related direct-gap transitions in Ge quantum wells

P Chaisakul, D Marris-Morini, MS Rouifed… - Applied Physics …, 2013 - pubs.aip.org
A strong quantum-confined Stark effect (QCSE) from light hole related transitions at the Γ
point (LH1-cΓ1) in Ge/Si 0.15 Ge 0.85 multiple quantum wells is demonstrated from both …

Enhanced indirect-to-direct inter-valley scattering in germanium under tensile strain for improving the population of electrons in direct valley

SH Huang, QQ Zheng, WM Xie, JY Lin… - Journal of Physics …, 2018 - iopscience.iop.org
A theoretical model is proposed to analyze the inter-valley electron transferring between
direct Γ and indirect L valleys, which sheds light on the electron conduction dynamics in (0 0 …

[PDF][PDF] 双能谷效应对N 型掺杂Si 基Ge 材料载流子晶格散射的影响

黄诗浩, 谢文明, 汪涵聪, 林光杨, 王佳琪, 黄巍, 李成 - 物理学报, 2018 - wulixb.iphy.ac.cn
性能优越的Si 基高效发光材料与器件的制备一直是Si 基光电集成电路中最具挑战性的课题之一.
Si 基Ge 材料不仅与成熟的硅工艺相兼容, 而且具有准直接带特性, 被认为是实现Si …

Germanium on silicon photonic devices

K Gallacher - 2013 - theses.gla.ac.uk
There is presently increased interest in using germanium (Ge) for both electronic and optical
devices on top of silicon (Si) substrates to expand the functionality of Si technology. It has …

Modeling and design of tin doped group IV alloy based QWEAM

P Pareek, R Ranjan, V Agarwal, L Singh… - Optical and Quantum …, 2019 - Springer
This work investigates vital characteristics of tin doped group IV based quantum well for its
potential as an electroabsorption modulator (EAM). Absorption coefficient and refractive …

The intervalley scattering between direct and indirect valleys in Ge for optimization of the germanium light

SH Huang, QQ Zheng, WM Xie, JY Lin… - … and Micro/Nano …, 2018 - spiedigitallibrary.org
Germanium material based on band gap engineering has aroused great interest for the
CMOS-compatible optoelectronic integrated circuits due to its quasi-direct band gap …

Silicon-Germanium Heterostructures for Silicon Photonics Applications

J Frigerio - 2014 - politesi.polimi.it
This first aim of this thesis is the development of high performance and low energy
modulators based on Ge/SiGe multiple quantum wells by exploiting the Quantum Confined …