Amorphization of SiO2 Thin Films by Using 200 MeV Ag15+ Ions
Abstract Effect of swift heavy ions (SHI) on low-k SiO 2 thin films has been investigated. SiO
2 thin films were deposited on pre-cleaned p-Si substrate by using sol-gel spin coating …
2 thin films were deposited on pre-cleaned p-Si substrate by using sol-gel spin coating …
Sol–gel deposited xerogel, aerogel and porogen based porous low- thin films: A comparative investigation
Low dielectric constant (Low-k) films are used as inter layer dielectric (ILD) in nanoelectronic
devices to reduce interconnect delay, crosstalk noise and power consumption. Tailoring …
devices to reduce interconnect delay, crosstalk noise and power consumption. Tailoring …
[PDF][PDF] GLOBAL JOURNAL OF ENGINEERING SCIENCE AND RESEARCHES
MNV Lanjulkar, NM Verulkar, CM Jadhao - gjesr.com
The introduction of various new materials and processes for fabrication of integrated circuit
(IC) revaluated a semiconductor industry during last two decades. Such revolution in …
(IC) revaluated a semiconductor industry during last two decades. Such revolution in …