Extreme ultraviolet lithography (EUVL) is a leading technology in semiconductor
manufacturing, enabling the creation of high-resolution patterns essential for advanced …

(57) ABSTRACT A method of operating an image sensor with a continuously moving object
is described. In this method, a timed delay integration mode (TDI-mode) operation can be …

An image sensor for short-wavelength light includes a semiconductor membrane, circuit
elements formed on one surface of the semiconductor membrane, and a pure boron layer on …

(57) ABSTRACT A photocathode is formed on a monocrystalline silicon substrate having
opposing illuminated (top) and output (bottom) surfaces. To prevent oxidation of the silicon …

(57) ABSTRACT A photomultiplier tube includes a semiconductor photocath ode and a
photodiode. Notably, the photodiode includes a p-doped semiconductor layer, an n-doped …

(57) ABSTRACT A method of inspecting a sample at high speed includes directing and
focusing radiation onto a sample, and receiving radiation from the sample and directing …

Staggered time delay and integration (TDI) scanning image acquisition systems are usually
employed in low signal-to-noise situations such as thermal imaging. Analysis and …

As integrated circuit fabrication processes continue to increase in complexity, it has been
determined that data collection, retention, and retrieval rates will continue to increase at an …

This paper delineates a comprehensive and successful application of decision tree
induction to 1054 records of production lots taken from a lithographic process with 45 …

An optical metrology device, such as an interferometer, detects sub-resolution defects on a
sample, ie, defects that are smaller than a pixel in the detector array of the inter ferometer …