Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …

This paper is the first from a set of two companion papers on radio-frequency (RF)
discharges. These two papers are in turn part of a larger series on the foundations of plasma …

Atomic layer etching (ALE), a cyclic process of surface modification and removal of the
modified layer, is an emerging damage-less etching technology for semiconductor …

The power absorption dynamics of electrons and the electrical asymmetry effect in
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …

The effects of the simultaneous presence of two different types of plasma asymmetry, viz,
geometric and electrical, on low-pressure capacitively coupled argon discharges are studied …

A particle-in-cell simulation study is performed to investigate the discharge asymmetry,
higher harmonic generations and electron heating mechanism in a low pressure …

The electrical asymmetry effect allows control of the discharge symmetry, the DC self-bias,
and charged particle energy distribution functions electrically by driving a capacitive radio …

Control of ion energy distributions (IEDs) onto the surface of wafers is an ongoing challenge
in microelectronics fabrication. The use of capacitively coupled plasmas (CCPs) using …

In magnetized capacitively coupled radio-frequency (RF) discharges operated at low
pressure the influence of the magnetic flux density on discharge properties has been studied …

Tailored voltage excitation waveforms provide an efficient control of the ion energy (through
the electrical asymmetry effect) in capacitive plasmas by varying the'amplitude'asymmetry of …