Metrology for the next generation of semiconductor devices

NG Orji, M Badaroglu, BM Barnes, C Beitia… - Nature …, 2018 - nature.com
The semiconductor industry continues to produce ever smaller devices that are ever more
complex in shape and contain ever more types of materials. The ultimate sizes and …

[PDF][PDF] 集成电路制造在线光学测量检测技术: 现状, 挑战与发展趋势

陈修国, 王才, 杨天娟, 刘佳敏, 罗成峰… - Laser & Optoelectronics …, 2022 - researching.cn
摘要在线测量检测技术与装备是保证集成电路(IC) 制造质量和良率的唯一有效技术手段, 在IC
制造过程中必须对IC 纳米结构的关键尺寸, 套刻误差, 以及缺陷等进行快速, 非破坏 …

[图书][B] Metrology and Diagnostic Techniques for Nanoelectronics

Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …

Bibliometric review of measurement uncertainty: Research classification and future tendencies

N Kusnandar, H Firdaus, I Supono, B Utomo… - Measurement, 2024 - Elsevier
This paper highlights the importance of measurement uncertainty in science, engineering,
and technology, to ensure accurate and reliable measurements. A bibliometric analysis that …

Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization

J Qin, RM Silver, BM Barnes, H Zhou… - Light: Science & …, 2016 - nature.com
Quantitative optical measurements of deep subwavelength, three-dimensional (3D),
nanometric structures with sensitivity to sub-nanometer details address a ubiquitous …

Balancing the trade-off between measurement uncertainty and measurement time in optical metrology using design of experiments, meta-modelling and convex …

D Gauder, J Gölz, M Biehler, M Diener… - CIRP Journal of …, 2021 - Elsevier
Micro gears represent key components in an increasing number of industry, applications. To
satisfy the increasing quality requirements in terms of lifetime and noise emissions, new …

Improved measurement accuracy in optical scatterometry using correction-based library search

X Chen, S Liu, C Zhang, H Jiang - Applied optics, 2013 - opg.optica.org
Library search is one of the most commonly used methods for solving the inverse problem in
optical scatterometry. The final measurement accuracy of the conventional library search …

Improved reconstruction of critical dimensions in extreme ultraviolet scatterometry by modeling systematic errors

MA Henn, H Gross, S Heidenreich… - Measurement …, 2014 - iopscience.iop.org
Scatterometry is a non-imaging indirect optical method that is frequently used to reconstruct
the critical dimensions (CD) of periodic nanostructures, eg structured wafer surfaces in …

Fourier domain optical tool normalization for quantitative parametric image reconstruction

J Qin, RM Silver, BM Barnes, H Zhou, F Goasmat - Applied optics, 2013 - opg.optica.org
There has been much recent work in developing advanced optical metrology methods that
use imaging optics for critical dimension measurements and defect detection. Sensitivity to …

Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression

MA Henn, RM Silver, JS Villarrubia… - Journal of Micro …, 2015 - spiedigitallibrary.org
Hybrid metrology, eg, the combination of several measurement techniques to determine
critical dimensions, is an increasingly important approach to meet the needs of the …