GaN-based power high-electron-mobility transistors on Si substrates: from materials to devices

N Wu, Z Xing, S Li, L Luo, F Zeng… - … Science and Technology, 2023 - iopscience.iop.org
Conventional silicon (Si)-based power devices face physical limitations—such as switching
speed and energy efficiency—which can make it difficult to meet the increasing demand for …

Impact of ZrO2 Dielectrics Thickness on Electrical Performance of TiO2 Thin Film Transistors with Sub-2 V Operation

J Zhang, M Jia, MG Sales, Y Zhao, G Lin… - ACS Applied …, 2021 - ACS Publications
In the present work, the impact of ZrO2 gate dielectric thickness on the electrical
performance of TiO2 thin film transistors (TFTs) is systematically investigated. Exhaustive …

[HTML][HTML] Interfacial band parameters of ultrathin ALD-ZrO2 on Ga-polar GaN through XPS measurements

S Qiu, J Gong, J Zhou, TK Ng, R Singh, M Sheikhi… - AIP Advances, 2023 - pubs.aip.org
Recent demonstrations of grafted pn junctions combining n-type GaN with p-type
semiconductors have shown great potential in achieving lattice-mismatch epitaxy-like …

Dynamic Characteristics of GaN MISHEMT With 5-nm In-Situ SiNx Dielectric Layer

Y Zhang, L Xu, Y Gu, H Guo, H Jiang… - IEEE Journal of the …, 2022 - ieeexplore.ieee.org
A comprehensive study on dynamic characteristics of GaN MISHEMT with a 5nm-thick in-situ
SiN x dielectric is presented. Effects of both negative and positive gate bias on threshold …

Low Threshold Voltage Shift in AlGaN/GaN MIS-HEMTs on Si Substrate Using SiNx/SiON as Composite Gate Dielectric

X Zhang, X Wei, P Zhang, H Zhang, L Zhang, X Deng… - Electronics, 2022 - mdpi.com
This study has demonstrated AlGaN/GaN metal-insulator-semiconductor high electron
mobility transistors (MIS-HEMTs) on Si substrates with a SiNx/SiON composite gate …

High-Performance TiO2 Thin-Film Transistors: In-Depth Investigation of the Correlation between Interface Traps and Oxygen Vacancies

C Samanta, S Yuvaraja, T Zhama, H Zhao… - ACS Applied …, 2024 - ACS Publications
The role of surface contamination, along with surface oxygen vacancies, plays a key role in
the overall carrier transport in thin-film transistors (TFTs). In this study, it is shown that the …

Electrical and photoelectrical characterization of Au/n-Si diode with sputtered ZrO2 interlayer

MG Obaid, YS Ocak, BA Albiss… - Journal of Materials …, 2023 - Springer
ZrO2 thin films were deposited on n-Si and quartz substrates by a reactive sputtering
technique. The morphological and optical characterization of a sputtered ZrO2 thin film …

High performance AlGaN/GaN MISHEMTs using N2O treated TiO2 as the gate dielectric

T Zhama, P Cui, Z Chen, J Zhang, H Zhao… - Semiconductor …, 2024 - iopscience.iop.org
In this work, TiO 2 thin films deposited by the atomic layer deposition (ALD) method were
treated with a special N 2 O plasma surface treatment and used as the gate dielectric for …

Multilayer MoS2 Back‐Gate Transistors with ZrO2 Dielectric Layer Optimization for Low‐Power Electronics

H Zhao, G Lin, P Cui, J Zhang… - physica status solidi (a), 2022 - Wiley Online Library
Herein, high‐performance back‐gate molybdenum disulfide (MoS2) field‐effect transistors
(FETs) with high‐quality sub‐20 nm high‐k dielectric layers are developed for high …

Influence of the ZrO2 gate dielectric layer on polarization coulomb field scattering in InAlN/GaN metal–insulator–semiconductor high-electron-mobility transistors

G Jiang, P Cui, G Zhang, Y Zeng, G Yang, C Fu… - Microelectronics …, 2022 - Elsevier
Abstract An InAlN/GaN MIS-HEMT with ZrO 2 gate dielectric layer and a Schottky-gate
InAlN/GaN HEMT were fabricated. Subsequently, the influence of ZrO 2 gate dielectric layer …