Nano crystalline diamond MicroWave Chemical Vapor Deposition growth on three dimension structured silicon substrates at low temperature

O Antonin, R Schoeppner, M Gabureac, L Pethö… - Diamond and Related …, 2018 - Elsevier
Nano crystalline diamond (NCD) films grown at a temperature below 400° C can open new
applications on temperature sensitive substrates such as polymers or low-melting point …

Chemical vapor infiltration (CVI)—Part I: a new technique to achieve diamond composites

A Glaser, SM Rosiwal, B Freels, RF Singer - Diamond and related materials, 2004 - Elsevier
Diamond/metal or diamond/ceramics penetration structures have a high potential as, eg
heat sinks in the microelectronic industry and for tribological applications. To learn more …

Nucleation and growth of CVD diamond films on patterned substrates

OR Monteiro, H Liu - Diamond and related materials, 2003 - Elsevier
The interest in using CVD diamond in the fabrication of microelectro-mechanical
components has steadily increased over the last few years. Typical technology for …

Conformal filling of silicon micropillar platform with b10oron

N Deo, JR Brewer, CE Reinhardt, RJ Nikolić… - Journal of Vacuum …, 2008 - pubs.aip.org
A recently proposed micropillar semiconductor platform filled with a high volume of isotopic
b 10 oron (B 10) has great potential to yield efficient thermal neutron detectors because B 10 …

Chemical vapor infiltration (CVI)—Part II: Infiltration of porous substrates with diamond by using a new designed hot-filament plant

A Glaser, SM Rosiwal, RF Singer - Diamond and related materials, 2006 - Elsevier
We designed a new hot-filament plant which features some new operating states for
chemical vapor infiltration (CVI) with diamond. Most characteristic for the new hot-filament …

Plasma etching chemistry for smoothening of ultrananocrystalline diamond films

DF Jaramillo-Cabanzo, GA Willing… - ECS Solid State …, 2015 - iopscience.iop.org
A new process to controllably smoothen ultrananocrystalline diamond films using H 2/O 2
plasma is presented. Diamond films were exposed to oxygen, hydrogen and …

The process window for diamond deposition from the vapor phase with sulfur in the C–H–O feed gas mixtures

G Bhimarasetti, MK Sunkara - Thin Solid Films, 2003 - Elsevier
Theoretical predictions using a modified radical species ternary diagram for C–H–O system
indicate that addition of sulfur expands the C–H–O gas phase compositional window for …

Effect of gas sources on the deposition of nano-crystalline diamond films prepared by microwave plasma enhanced chemical vapor deposition

J Weng, L Xiong, J Wang, W Man… - Plasma Science and …, 2010 - iopscience.iop.org
Nano-crystalline diamond (NCD) films were deposited on silicon substrates by a microwave
plasma enhanced chemical vapor deposition (MPCVD) reactor in C 2 H 5 OH/H 2 and CH …

Nanocrystalline diamond matrix deposited on copper substrate by radical species restricted diffusion

Z Yu, X Liu, Q Wei, T Yang, M Tian… - Journal of Nanoscience …, 2013 - ingentaconnect.com
Nanocrystalline diamond matrix (or patterned nanocrystalline diamond) have been grown by
hot filament chemical vapor deposition (HFCVD) on copper substrates, which were masked …

Croissance de diamant nano-cristallin (NCD) par procédés plasmas en configuration matricielle de sources élémentaires (MEPS) microondes

O Antonin - 2022 - theses.hal.science
La croissance de diamant sur des matériaux non réfractaires nécessite le développement
de procédés innovants capables de couvrir de grandes surfaces tout en optimisant l'apport …