Process window based on defect probability
A Slachter, S Hunsche, WT Tel, AB Van Oosten… - US Patent …, 2021 - Google Patents
A method including obtaining (i) measurements of a parameter of the feature,(ii) data related
to a process variable of a patterning process,(iii) a functional behavior of the parameter …
to a process variable of a patterning process,(iii) a functional behavior of the parameter …
Wavefront optimization for tuning scanner based on performance matching
DFS Hsu, CRKC Hennerkes, RC Howell, Z Shi… - US Patent …, 2023 - Google Patents
2020-12-14 Assigned to ASML NETHERLANDS BV reassignment ASML NETHERLANDS
BV ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS) …
BV ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS) …
Wavefront optimization for tuning scanner based on performance matching
DFS Hsu, CRKC Hennerkes, RC Howell, Z Shi… - US Patent …, 2024 - Google Patents
A method for determining a wavefront parameter of a patterning process. The method
includes obtaining a reference performance (eg, a contour, EPE, CD) of a reference …
includes obtaining a reference performance (eg, a contour, EPE, CD) of a reference …
Process window based on defect probability
A Slachter, S Hunsche, WT Tel, AB Van Oosten… - US Patent …, 2023 - Google Patents
A method including obtaining (i) measurements of a parameter of the feature,(ii) data related
to a process variable of a patterning process,(iii) a functional behavior of the parameter …
to a process variable of a patterning process,(iii) a functional behavior of the parameter …