This work investigates the effects of deposition temperature on the wear behavior and
material properties of recently developed plasma enhanced atomic layer deposited (PEALD) …

The development of transparent conductive materials is of great interest for a wide variety of
semiconducting devices in the fields of optoelectronics and photovoltaics. Here, we optimize …

In this work, we have investigated and optimized the Al-delta-doped ZnO (δ-AZO)
superlattices for mid-infrared applications. Thin films of δ-AZO are fabricated by atomic layer …

TiO 2 thin films prepared by atomic layer deposition (ALD) have attracted great attention due
to the widespread application of the oxide as a promising charge storage material for lithium …

Surface silanols (SiOH) are important moieties on glass surfaces. Here we present a tag-and-
count approach for determining surface silanol densities, which consists of tagging surface …

Zinc oxide (ZnO) is a transparent wide band gap semiconductor material with various
possible applications in form of thin films. Most previous studies on atomic layer deposition …

Due to shortcomings such as poor homogeneity of Al doping, precisely controlling the
thickness, inability to conformally deposit on high aspect ratio devices and high pinhole rate …

Al 2 O 3 and ZnO thin films were deposited from trimethylaluminium (TMA) and diethylzinc
(DEZ) in combination with water using cylindrical rotating substrate spatial atomic layer …

The research explored the spontaneous formation of the BAp precursor on surfaces of HfO 2
films obtained by Atomic Layer Deposition (ALD). It has been found that a careful selection …

Spatial atomic layer deposition (SALD) is a promising thin film deposition technique that
enables fast, large-scale deposition and nanoscale thickness control by utilizing spatially …