A novel approach of chemical mechanical polishing for cadmium zinc telluride wafers

Z Zhang, B Wang, P Zhou, R Kang, B Zhang, D Guo - Scientific reports, 2016 - nature.com
A novel approach of chemical mechanical polishing (CMP) is developed for cadmium zinc
telluride (CdZnTe or CZT) wafers. The approach uses environment-friendly slurry that …

Edge effect in ohmic contacts on high-resistivity semiconductors

A Ruzin - Nuclear Instruments and Methods in Physics Research …, 2016 - Elsevier
Current increase due to edge effect in ohmic contacts was calculated by finite-element
software in three-dimensional devices. The emphasis in this study is on semi-intrinsic (SI) …

Scaling effects in Schottky contacts

A Ruzin - Journal of Applied Physics, 2015 - pubs.aip.org
This article reports on scaling effects in Schottky contacts on various types of
semiconductors, including low resistivity, semi-intrinsic, and deep-level compensated. The …

Scaling effects in ohmic contacts on semiconductors

A Ruzin - Journal of Applied Physics, 2015 - pubs.aip.org
This article reports on scaling effects calculated with ohmic contacts on various types of high
and low resistivity semiconductors, from near-intrinsic to heavily compensated. The …

[引用][C] Soft-Brittle Semiconductors Polishing with Environment-Friendly Slurries

Z Zhang, B Wang, D Guo - 2018