Hf0. 5Zr0. 5O2/HfO2/Hf0. 5Zr0. 5O2 Laminated Thin Films and CF4 Plasma Passivation for Improved Memory and Synaptic Characteristics of Ferroelectric Field Effect …

K Park, C Chung, B Ku, S Yun, J Park, C Choi - Nanoscale, 2025 - pubs.rsc.org
In this study, we demonstrate significant advancements in hafnium oxide based ferroelectric
field-effect transistors (FeFET) by integrating two engineering methods: laminated …

Oxygen reservoir effect of Tungsten trioxide electrode on endurance performance of ferroelectric capacitors for FeRAM applications

Y Choi, J Shin, J Min, S Moon, D Chu, D Han… - Scientific Reports, 2024 - nature.com
The effect of W and WO3 electrodes on the ferroelectric characteristics of HZO (Zr-doped
HfO2)-based MFM (metal-ferroelectric-metal) capacitors was investigated. During the …

Impact of the Crystal Structure of Interlayer on the Properties of Zr‐Doped Hafnia‐Based Ferroelectric Capacitor

I Park, Y Choi, C Shin - physica status solidi (a), 2024 - Wiley Online Library
In this work, the effect of interlayer on the ferroelectric properties of Hf0. 5Zr0. 5O2 (HZO)‐
based metal–ferroelectric–metal (MFM) capacitor is investigated. In detail, a 1 nm thick …