Sputtering is an effective technique for producing ultrathin films with diverse applications. The review begins by providing an in-depth overview of the background, introducing the …
The present study investigates the application of hole‐selective transition metal oxide (TMO) layers (MoOx, V2Ox, and WOx) with silver (Ag) as full‐area rear contact to 22.5 μm‐thick low …
We present the feasibility of integrating substoichiometric molybdenum oxide (MoOx) as hole‐selective rear contact into the production sequence of industrial scale p‐type …
The thermal evaporation technique has been frequently used for the deposition of sub- stoichiometric molybdenum oxide (MoO 3) films. This approach requires a high temperature …
Thin SiO x interlayers are often formed naturally during the deposition of transition metal oxides on silicon surfaces due to interfacial reaction. The SiO x layer, often only several …
Solution-processable copper-doped non-stoichiometric molybdenum oxide (Cu: MoO x) films were prepared by a sol–gel method and applied as hole injection layer (HIL) in …
Tunable optoelectronic properties of Molybdenum oxide (MoO 3-x) make it a suitable applicant for its use as a catalyst and a hole transport layer. Oxygen vacancies play a vital …
The dopant-related issues are amongst the major performance bottleneck in crystalline silicon solar cells that can be alleviated via implementation of dopant-free layers. This work …
Electrical data of the Schottky structure with CdZnO interlayer have been evaluated for different illumination intensities. Considering such parameters as, the ideality factor (n) …