Extreme ultraviolet lithography and three dimensional integrated circuit—A review

B Wu, A Kumar - Applied Physics Reviews, 2014 - pubs.aip.org
The term 3D IC generally means an IC package having multiple device layers, which is
different with 3D transistor structures such as the FinFET. 3D packaging and 3D integration …

Frequency-modulated mems gyroscopes: A review

X Ren, X Zhou, S Yu, X Wu, D Xiao - IEEE sensors journal, 2021 - ieeexplore.ieee.org
As a high-precision angular rate sensor, the Frequency-Modulated (FM) gyroscope based
on MEMS craft has attracted more and more attention in recent years, owing to its …

[图书][B] Three-dimensional integrated circuit design

VF Pavlidis, I Savidis, EG Friedman - 2017 - books.google.com
Three-Dimensional Integrated Circuit Design, Second Eition, expands the original with more
than twice as much new content, adding the latest developments in circuit models …

[图书][B] On-chip communication architectures: system on chip interconnect

S Pasricha, N Dutt - 2010 - books.google.com
Over the past decade, system-on-chip (SoC) designs have evolved to address the ever
increasing complexity of applications, fueled by the era of digital convergence …

[引用][C] Microelectronic applications of chemical mechanical planarization

Y Li - 2007 - books.google.com
An authoritative, systematic, and comprehensive description of current CMP technology
Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of …

Mechanical properties of nickel-graphene composites synthesized by electrochemical deposition

Z Ren, N Meng, K Shehzad, Y Xu, S Qu, B Yu… - …, 2015 - iopscience.iop.org
Graphene (Gr) nanosheets with multilayer structures were dispersed in a nickel (Ni) plating
solution by using a surfactant with a magnetic stirring method. Gr nanosheets were …

Fabrication and characterization of the capillary performance of superhydrophilic Cu micropost arrays

Y Nam, S Sharratt, C Byon, SJ Kim… - Journal of …, 2010 - ieeexplore.ieee.org
We report the fabrication of dense arrays of super-hydrophilic Cu microposts at solid
fractions as high as 58% and aspect ratios as high as four using electrochemical deposition …

A study of thermo-mechanical stress and its impact on through-silicon vias

N Ranganathan, K Prasad… - Journal of …, 2008 - iopscience.iop.org
The BOSCH etch process, which is commonly used in microelectromechanical system
fabrication, has been extensively investigated in this work for implementation in through …

Microsystems using three-dimensional integration and TSV technologies: Fundamentals and applications

Z Wang - Microelectronic Engineering, 2019 - Elsevier
As a powerful enabling technology, three-dimensional (3D) integration, which uses wafer
bonding to integrate multiple wafers in the vertical direction and uses through‑silicon-vias …

Aspect-ratio-dependent copper electrodeposition technique for very high aspect-ratio through-hole plating

P Dixit, J Miao - Journal of the Electrochemical society, 2006 - iopscience.iop.org
Copper electrodeposition in high-aspect-ratio through-holes micromachined by deep
reactive ion etching is one of the most essential processes for fabricating through-wafer …