Hysteresis in carbon nanotube transistors: measurement and analysis of trap density, energy level, and spatial distribution

RS Park, MM Shulaker, G Hills… - ACS …, 2016 - ACS Publications
We present a measurement technique, which we call the Pulsed Time-Domain
Measurement, for characterizing hysteresis in carbon nanotube field-effect transistors, and …

ALD deposited bipolar HfOx films for silicon surface passivation

S Tomer, A Kumar, M Devi - Surfaces and Interfaces, 2023 - Elsevier
Hafnium oxide thin films consist of trap states which can degrade or enhance the device
performance depending upon the application. These trap states play a crucial role in silicon …

Investigating wet chemical oxidation methods to form SiO2 interlayers for self-aligned Pt-HfO2-Si gate stacks

AC Brummer, S Kurup, D Aziz, MA Filler… - Journal of Vacuum …, 2023 - pubs.aip.org
Self-aligned metal-oxide-semiconductor (MOS) capacitors are studied with several low-
temperature, wet chemical silicon dioxide (SiO 2) interlayers to understand their impact on …

Wafer-scale very large memory windows in graphene monolayer/HfZrO ferroelectric capacitors

M Dragoman, M Modreanu, IM Povey… - …, 2018 - iopscience.iop.org
We have fabricated and electrically characterized at the wafer scale tens of metal-
ferroelectric (HfZrO)-semiconductor capacitors and metal-graphene monolayer-ferroelectric …

Distinguishing bulk traps and interface states in deep-level transient spectroscopy

AVP Coelho, MC Adam… - Journal of Physics D …, 2011 - iopscience.iop.org
A new method for the distinction of discrete bulk deep levels and interface states related
peaks in deep-level transient spectroscopy spectra is proposed. The measurement of two …

High-ĸ dielectric oxide as an interfacial layer with enhanced photo-generation for Gr/Si solar cells

MF Bhopal, K Akbar, MA Rehman, D won Lee… - Carbon, 2017 - Elsevier
In recent years, graphene (Gr) based solar cells have attracted extensive interest because of
their ability to produce low cost and highly efficient solar cells. Conventional Gr/Si Schottky …

Study on transient photocurrent induced by energy level defect of schottky diode irradiated by high power pulsed laser

YH Wang, JH Su, TW Wang, ZY Lei, ZJ Chen… - Scientific Reports, 2023 - nature.com
The transient photocurrent is one of the key parameters of the spatial radiation effect of
photoelectric devices, and the energy level defect affects the transient photocurrent. In this …

Electrical properties of atomic-layer-deposited thin gadolinium oxide high-k gate dielectrics

S Dueñas, H Castán, H Garcia, A Gómez… - Journal of The …, 2007 - iopscience.iop.org
Amorphous or cubic thin films were grown from tris (2, 3-dimethyl-2-butoxy) gadolinium (III),,
and precursors at. As-deposited films grown on etched (H-terminated) Si (100) exhibited …

Study of γ-ray irradiation influence on TiN/HfO2/Si MOS capacitor by CV and DLTS

Y Li, Y Ma, W Lin, P Dong, Z Yang, M Gong, J Bi… - Superlattices and …, 2018 - Elsevier
Abstract Gamma-ray (γ-ray) irradiation effects on HfO 2-based MOS capacitors have been
studied. The capacitance-voltage (CV) characteristic was measured at room temperature …

Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature

K Kukli, J Aarik, T Uustare, J Lu, M Ritala, A Aidla… - Thin Solid Films, 2005 - Elsevier
HfO2 films were atomic layer deposited from HfCl4 and H2O on Si (100) in the temperature
range of 300–600° C. At low temperatures, films grow faster and are structurally more …