YY Wang, HJ Shen, Y Bai, YD Tang, KA Liu… - Chinese …, 2013 - iopscience.iop.org
High-temperature annealing of the atomic layer deposition (ALD) of Al 2 O 3 films on 4H-SiC
in O 2 atmosphere is studied with temperature ranging from 800 C to 1000 C. It is observed …