5-Amino-1, 3, 4-thiadiazole-2-thiol as a new leveler for blind holes copper electroplating: Theoretical calculation and electrochemical studies

M Zhou, Y Meng, J Ling, Y Zhang, W Huang, Y Min… - Applied Surface …, 2022 - Elsevier
High density interconnection printed circuit board PCB puts forward high requirements for
defect free blind holes copper filling. Here, 5-amino-1, 3, 4-thiadiazole-2-mercaptan, a small …

Structural influence of nitrogen-containing groups on triphenylmethane-based levelers in super-conformal copper electroplating

Z Li, B Tan, J Luo, J Qin, G Yang, C Cui, L Pan - Electrochimica Acta, 2022 - Elsevier
Leveler is one of the most important additives for super-conformal copper electroplating,
which has been widely applied in the fabrication of nanoscale (or microscale) interconnect …

Experimental and theoretical study of the new leveler basic blue 1 during copper superconformal growth

Y Li, C Li, R Li, X Peng, J Zhang, P Yang… - … applied materials & …, 2023 - ACS Publications
A novel chlorinated functional group-modified triphenylmethane derivative leveler BB1 is
used to achieve superconformal electrodeposition in microvias. Cyclic voltammetry (CV) and …

Investigation of synthesized carbazole derivative Cz-BPDB as a high-performance leveler for copper electroplating

B Yuan, W Zhou, X Li, Y Xie, X Yin, X Chen… - Surface and Coatings …, 2023 - Elsevier
Electroplating additives, especially levelers of copper electroplating, are the most critical
components of electroplating solutions in the manufacture of printed circuit boards and …

Novel, simple, and green citrate-based copper electronic electroplating bath in microvia void-free filling for printed circuit board application

L Jin, WQ Li, ZY Wang, JQ Yang… - ACS Sustainable …, 2022 - ACS Publications
In this work, a novel, simple, and green citrate-based copper electronic electroplating bath
with the characteristics of weak corrosion, low copper ion concentration, and simple …

Combined fluid flow simulation with electrochemical measurement for mechanism investigation of high-rate Cu pattern electroplating

Q Wang, Z Wang, Y Wang, Y Tong, M Chen - Journal of the Taiwan Institute …, 2022 - Elsevier
Background Cu pattern electroplating plays an essential role in the interconnection and
microstructure fabrication of high-power device packaging. However, improving efficiency …

Structural influence of terminal functional groups on TEG-based leveler in microvia filling

MH Lee, Y Lee, M Sung, SK Cho… - Journal of the …, 2020 - iopscience.iop.org
We synthesize new triethylene glycol-based levelers containing quaternary ammonium
groups with different terminal functional groups (allyl, propyl, benzyl, and naphthylmethyl) to …

Bis-(sodium sulfoethyl)-disulfide: a promising accelerator for super-conformal copper electrodeposition with wide operating concentration ranges

Z Li, B Tan, M Shi, J Luo, Z Hao, J He… - Journal of the …, 2020 - iopscience.iop.org
Accelerators are indispensable additives for super-conformal copper electrodeposition,
which has been widely applied in the fabrication of integrated circuits (ICs), printed circuit …

Five-membered heterocyclic small molecule compounds as novel levelling agents for blind-hole copper plating

T Zhang, C Zheng, H Li, S Song, W Huang, Q Li… - Journal of …, 2024 - Elsevier
A defect free copper interconnect is crucial for ensuring the electrical connection and
transmission of high-density interconnect printed circuit boards. Leveling agent is a key …

Effects of DPS on surface roughness and mechanical properties of electrodeposited copper foils

R Zhang, S Yang, S Qin, P Wang… - Crystal Research …, 2023 - Wiley Online Library
The roughness and mechanical properties of ultra‐low profile electrolytic copper foil
seriously affect and restrict its application in high‐frequency/high‐speed printed circuit …