Negative bias temperature instability: Road to cross in deep submicron silicon semiconductor manufacturing

DK Schroder, JA Babcock - Journal of applied Physics, 2003 - pubs.aip.org
We present an overview of negative bias temperature instability (NBTI) commonly observed
in p-channel metal–oxide–semiconductor field-effect transistors when stressed with negative …

Negative bias temperature instability: What do we understand?

DK Schroder - Microelectronics Reliability, 2007 - Elsevier
We present a brief overview of negative bias temperature instability (NBTI) commonly
observed for in p-channel metal–oxide–semiconductor field-effect transistors (MOSFETs) …

Quantum engineering at the silicon surface using dangling bonds

SR Schofield, P Studer, CF Hirjibehedin… - Nature …, 2013 - nature.com
Individual atoms and ions are now routinely manipulated using scanning tunnelling
microscopes or electromagnetic traps for the creation and control of artificial quantum states …

[图书][B] Reliability wearout mechanisms in advanced CMOS technologies

AW Strong, EY Wu, RP Vollertsen, J Sune, G La Rosa… - 2009 - books.google.com
This invaluable resource tells the complete story of failure mechanisms—from basic
concepts to the tools necessary to conduct reliability tests and analyze the results. Both a …

Parameterisation of injection-dependent lifetime measurements in semiconductors in terms of Shockley-Read-Hall statistics: An application to oxide precipitates in …

JD Murphy, K Bothe, R Krain, VV Voronkov… - Journal of Applied …, 2012 - pubs.aip.org
Injection-dependent minority carrier lifetime measurements are a valuable characterisation
method for semiconductor materials, particularly those for photovoltaic applications. For a …

Computational study on interfaces and interface defects of amorphous silica and silicon

P Li, Y Song, X Zuo - physica status solidi (RRL)–Rapid …, 2019 - Wiley Online Library
The amorphous SiO2/Si interface is arguably the most important part in semiconductor
technology, strongly influencing the device reliability. Its electronic structure is affected by …

Dephasing of Si spin qubits due to charge noise

D Culcer, X Hu, S Das Sarma - Applied Physics Letters, 2009 - pubs.aip.org
Spin qubits in silicon quantum dots can have long coherence times, yet their manipulation
relies on the exchange interaction, through which charge noise can induce decoherence …

Dangling-bond spin relaxation and magnetic noise from the amorphous-semiconductor/oxide interface: Theory

R De Sousa - Physical Review B—Condensed Matter and Materials …, 2007 - APS
We propose a model for magnetic noise based on spin flips (not electron trapping) of
paramagnetic dangling bonds at the amorphous-semiconductor/oxide interface. A wide …

Atomic-scale defects involved in the negative-bias temperature instability

JP Campbell, PM Lenahan… - … on Device and …, 2007 - ieeexplore.ieee.org
This paper examines the atomic-scale defects involved in a metal-oxide-silicon field-effect-
transistor reliability problem called the negative-bias temperature instability (NBTI). NBTI has …

Interacting random-field dipole defect model for heating in semiconductor-based qubit devices

Y Choi, R Joynt - Physical Review Research, 2024 - APS
Semiconductor qubit devices suffer from the drift of important device parameters as they are
operated. The most important example is a shift in qubit operating frequencies. This effect …