Recent advances in corrosion science applicable to disposal of high-level nuclear waste

GS Frankel, JD Vienna, J Lian, X Guo, S Gin… - Chemical …, 2021 - ACS Publications
High-level radioactive waste is accumulating at temporary storage locations around the
world and will eventually be placed in deep geological repositories. The waste forms and …

Beyond the average: spatial and temporal fluctuations in oxide glass-forming systems

KA Kirchner, DR Cassar, ED Zanotto, M Ono… - Chemical …, 2022 - ACS Publications
Atomic structure dictates the performance of all materials systems; the characteristic of
disordered materials is the significance of spatial and temporal fluctuations on composition …

Atomic-scale surface of fused silica induced by chemical mechanical polishing with controlled size spherical ceria abrasives

G Xu, Z Zhang, F Meng, L Liu, D Liu, C Shi… - Journal of Manufacturing …, 2023 - Elsevier
Fused silica is widely used in precision optical devices for its excellent optical properties.
However, it has hard and brittle nature, becoming a difficult-to-process material. This makes …

Vibrational spectroscopy analysis of silica and silicate glass networks

H Liu, H Kaya, YT Lin, A Ogrinc… - Journal of the American …, 2022 - Wiley Online Library
Vibrational spectroscopy has been widely used to investigate various structural aspects of
the glass network, and there are a plethora of papers reporting subtle but consistent …

Double-layered core–shell heterostructures of mSiO2@ CdS@ CeO2 abrasive systems toward photochemical mechanical polishing (PCMP) applications

M Wang, Z Mu, T Wang, Y Chen, A Chen - Applied Surface Science, 2023 - Elsevier
Photochemical mechanical polishing (PCMP) technique, involved the cooperation of light-
driven surface modification and force-induced material removal, is expected to be a clean …

Highly dispersed Gd-CeO2 nanocrystals supported on mesoporous silica composite particles towards photochemical (photo-assisted chemical) mechanical polishing

Y Chen, L Zhong, A Chen, M Fu, X Lu - Ceramics International, 2023 - Elsevier
Nanoparticles (NPs) are widely used in polishing slurries for ensuring desired material
removal and global planarization. Herein, novel multicomponent core–shell abrasive …

Surface chemistry, water adsorption/desorption, and electrostatic charging behavior of display glass panel: Effect of rinsing solution pH

YT Lin, AN Zoba, NJ Smith, J Banerjee, AC Antony… - Applied Surface …, 2024 - Elsevier
This study explored the effects of rinsing solutions on the surface energy and elemental
composition of Corning's EAGLE-XG® display glass, as well as its water …

Atomistic insights into scratch-induced structural evolution of silica glass

S Sahoo, S Mannan, U Tiwari, RR Kaware, Z Ye… - Acta Materialia, 2025 - Elsevier
Understanding the mechanism of scratch damage is vital to developing better scratch-
resistant glasses. To this extent, employing molecular dynamics simulations and …

Vessel effects in organic chemical reactions; a century-old, overlooked phenomenon

MM Nielsen, CM Pedersen - Chemical Science, 2022 - pubs.rsc.org
One of the most intriguing aspects of synthetic chemistry is the interplay of numerous
dependent and independent variables en route to achieve a successful, high-yielding …

[HTML][HTML] Effect of adsorbed water on mechanical and mechanochemical properties of silicate glasses

H He, J Yu - Journal of Non-Crystalline Solids: X, 2023 - Elsevier
During the manufacturing and in-service process, the water molecules from the humid or
liquid environments are ubiquitous on glass surface, which can alter the various surface …