Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach

PP Angelopoulou, I Moutsios, GM Manesi… - Progress in Polymer …, 2022 - Elsevier
This review article discusses the origins of self-assembly behavior of linear and non-linear
block co-and terpolymers and their application towards the fabrication of high-resolution …

[HTML][HTML] Poly (vinylpyridine)-containing block copolymers for smart, multicompartment particles

D Lee, J Kim, KH Ku, S Li, JJ Shin, BJ Kim - Polymer Chemistry, 2022 - pubs.rsc.org
Multicompartment particles generated by the self-assembly of block copolymers (BCPs)
have received considerable attention due to their unique morphologies and functionalities. A …

High χ–Low N Block Polymers: How Far Can We Go?

C Sinturel, FS Bates, MA Hillmyer - 2015 - ACS Publications
Block polymers incorporating highly incompatible segments are termed “high χ” polymers,
where χ is the Flory–Huggins interaction parameter. These materials have attracted a great …

Poly (vinylpyridine) segments in block copolymers: Synthesis, self-assembly, and versatility

JG Kennemur - Macromolecules, 2019 - ACS Publications
This Perspective provides a current survey on the synthesis, self-assembly, and vast variety
of applications possible from block copolymer (BCP) systems containing at least one …

Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly

S Maekawa, T Seshimo, T Dazai, K Sato… - Nature …, 2024 - nature.com
While block copolymer (BCP) lithography is theoretically capable of printing features smaller
than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we …

Synthesis and self-assembly of discrete dimethylsiloxane–lactic acid diblock co-oligomers: the dononacontamer and its shorter homologues

B van Genabeek, BFM de Waal… - Journal of the …, 2016 - ACS Publications
Most of the theoretical and computational descriptions of the phase behavior of block
copolymers describe the chain ensembles of perfect and uniform polymers. In contrast …

Fabrication of sub-3 nm feature size based on block copolymer self-assembly for next-generation nanolithography

J Kwak, AK Mishra, J Lee, KS Lee, C Choi… - …, 2017 - ACS Publications
For ultrahigh-density storage media and D-RAM, the feature size of lithography should be
much reduced (say less than 10 nm). Though some research groups reported feature size of …

[HTML][HTML] Field theoretic approach for block polymer melts: SCFT and FTS

MW Matsen - The Journal of Chemical Physics, 2020 - pubs.aip.org
This perspective addresses the development of polymer field theory for predicting the
equilibrium phase behavior of block polymer melts. The approach is tailored to the high …

Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning

Y Luo, D Montarnal, S Kim, W Shi, KP Barteau… - …, 2015 - ACS Publications
We report herein the modular synthesis and nanolithographic potential of poly
(dimethylsiloxane-block-methyl methacrylate)(PDMS-b-PMMA) with self-assembled …

Self-assembly of an ultrahigh-χ block copolymer with versatile etch selectivity

K Azuma, J Sun, Y Choo, Y Rokhlenko… - …, 2018 - ACS Publications
We report the successful synthesis of previously inaccessible poly (3-hydroxystyrene)-block-
poly (dimethylsiloxane)(P3HS-b-PDMS) block copolymers (BCPs) with varying volume …