Current transistor technology has issues with off-state current which reduces power efficiency. The paper presents a novel Normally-off Underlapped Dual Gate (U-DG) …
N Amina, T Zine-eddine, M Zitouni, S Okba… - Power Electronic Devices …, 2025 - Elsevier
This paper presents a numerical simulation study of an E-mode AlInGaN/AlN/GaN metal oxide semiconductor high electron mobility transistor (MOSHEMT) grown on an ultra-wide …
The Authors through this paper have investigated and performed an in-depth study of the Analog performances of an Underlapped Dual Gate (U-DG) Si/SiGe Metal Oxide …
K Sorkhel, A Ghosh, H Mukherjee… - 2023 IEEE 2nd …, 2023 - ieeexplore.ieee.org
This article investigates the effect of varying buffer layer width of underlapped double gate InAlGaN/GaN MOS-HEMT's with Hafnium based high-k dielectric gate oxide material on its …
C Chakraborty, A Kundu - 2024 5th International Conference …, 2024 - ieeexplore.ieee.org
This paper undertakes a thorough exploration and analysis of the analog performance of a novel Normally off AlGaN/GaN Underlapped Metal Oxide Semiconductor-High Electron …
This paper aims to elucidate a comparative and analytical study based on the analog characteristics of a Symmetrical Underlap DG Si/SiGe-based MOS-HEMT with varying …