Improved Ferroelectricity and Tunneling Electro Resistance in Zr-Rich HfxZr1-xO2 Ferroelectric Tunnel Junction

J Yu, T Wang, Z Li, Y Liu, J Meng, K Xu… - IEEE Electron …, 2022 - ieeexplore.ieee.org
HfO2 based ferroelectric materials have great application potential in ferroelectric tunneling
junction. Here, the low temperature annealed Zr-Rich HfxZr films based ferroelectric tunnel …

Ferroelectric Hf0.5Zr0.5O2 for Analog Memory and In‐Memory Computing Applications Down to Deep Cryogenic Temperatures

H Bohuslavskyi, K Grigoras, M Ribeiro… - Advanced Electronic …, 2024 - Wiley Online Library
Low‐power nonvolatile memories operating down to deep cryogenic temperatures are
important for a large spectrum of applications from high‐performance computing, electronics …

Harnessing ferroic ordering in thin film devices for analog memory and neuromorphic computing applications down to deep cryogenic temperatures

S Majumdar - Frontiers in Nanotechnology, 2024 - frontiersin.org
The future computing beyond von Neumann era relies heavily on emerging devices that can
extensively harness material and device physics to bring novel functionalities and can …

Innovative Ultralow Thermal Budget ZrHfOx Ferroelectric Films with Low-Temperature Phase Transition for Next-Generation High-Speed Multifunctional Devices

Y Liu, T Wang, Y Song, K Xu, R Yuan, Z Li, J Yu… - Nano Letters, 2024 - ACS Publications
By design of the element concentration, regulating the ratio of the t phase and the energy
difference between t and o phases, the ZrHfOx (ZHO) film demonstrated the highest …

[HTML][HTML] Towards scalable cryogenic quantum dot biasing using memristor-based DC sources

PA Mouny, R Dawant, P Dufour, M Valdenaire… - Cryogenics, 2024 - Elsevier
Cryogenic memristor-based DC sources offer a promising avenue for in situ biasing of
quantum dot arrays. In this study, we present experimental results and discuss the scaling …

Damage mitigation as a strategy to achieve high ferroelectricity and reliability in hafnia for random-access-memory

J Hwang, H Shin, C Kim, J Ahn, S Jeon - Journal of Materials Chemistry …, 2025 - pubs.rsc.org
Ferroelectric materials, characterized by their polarization switching capabilities, have
emerged as promising candidates for non-volatile memory applications due to their fast …

Cryogenic Ferroelectricity of HZO Capacitors on a III-V Semiconductor

MK Ram, H Dahlberg… - IEEE Electron Device …, 2024 - ieeexplore.ieee.org
Non-volatile cryogenic memories are crucial for realizing energy-efficient and scaled
quantum computing systems. In this letter, we evaluate the cryogenic performance of an …

Enhanced performance of hafnia self-rectifying ferroelectric tunnel junctions at cryogenic temperatures

J Hwang, C Kim, J Ahn, S Jeon - Nano Convergence, 2024 - Springer
The advancement in high-performance computing technologies, including quantum and
aerospace systems, necessitates components that operate efficiently at cryogenic …

Ferroelectric tunnel junctions: current status and future prospect as a universal memory

U Sharma, G Kumar, S Mishra, R Thomas - Frontiers in Materials, 2023 - frontiersin.org
The semiconductor industry is actively looking for an all-encompassing memory solution that
incorporates the advantageous aspects of current technology. This features non-volatility …

Ferroelectric Tunnel Junction Based on Asymmetric Barrier–Well–Barrier Structure: The Role of Resonant Tunneling

P Chang, Y Xie - IEEE Transactions on Electron Devices, 2023 - ieeexplore.ieee.org
An innovative resonant ferroelectric tunnel junction (FTJ) based on asymmetric barrier–well–
barrier structure is theoretically proposed. It is achieved by metal–ferroelectric–dielectric …