Dielectric relaxation of high-k oxides
Frequency dispersion of high-k dielectrics was observed and classified into two parts:
extrinsic cause and intrinsic cause. Frequency dependence of dielectric constant (dielectric …
extrinsic cause and intrinsic cause. Frequency dependence of dielectric constant (dielectric …
Structural, chemical and optical properties of cerium dioxide film prepared by atomic layer deposition on TiN and Si substrates
S Vangelista, R Piagge, S Ek, T Sarnet, G Ghidini… - Thin Solid Films, 2017 - Elsevier
Thin films of cerium dioxide (CeO 2) were deposited by atomic layer deposition (ALD) at
250° C on both Si and titanium nitride (TiN) substrates. The ALD growth produces CeO 2 …
250° C on both Si and titanium nitride (TiN) substrates. The ALD growth produces CeO 2 …
Review on process-microstructure-performance relationship in ALD-engineered SOFCs
Solid oxide fuel cells (SOFCs) are promising candidates for next-generation energy
conversion devices, and much effort has been made to lower their operating temperature for …
conversion devices, and much effort has been made to lower their operating temperature for …
[HTML][HTML] The effect of molybdenum dopant on rare earth metal chalcogenide material
This study used electrochemical deposition to make CeTe and CeTe-doped molybdenum.
We deposited the films at varying concentrations of the dopant;(0.1–0.3) mol%. All the …
We deposited the films at varying concentrations of the dopant;(0.1–0.3) mol%. All the …
On the physical and chemical details of alumina atomic layer deposition: A combined experimental and numerical approach
Alumina thin film is typically studied as a model atomic layer deposition (ALD) process due
to its high dielectric constant, high thermal stability, and good adhesion on various wafer …
to its high dielectric constant, high thermal stability, and good adhesion on various wafer …
Irradiation effects on microstructure change in nanocrystalline ceria–Phase, lattice stress, grain size and boundaries
PD Edmondson, Y Zhang, S Moll, F Namavar… - Acta Materialia, 2012 - Elsevier
With a wide variety of applications in numerous industries, ranging from biomedical to
nuclear, ceramics such as ceria are key engineering materials. It is possible to significantly …
nuclear, ceramics such as ceria are key engineering materials. It is possible to significantly …
Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO2
HC Aspinall, J Bacsa, AC Jones, JS Wrench… - Inorganic …, 2011 - ACS Publications
Thin films of ceria (CeO2) have many applications, and their synthesis by liquid-injection
MOCVD (metal–organic chemical vapor deposition) or ALD (atomic layer deposition) …
MOCVD (metal–organic chemical vapor deposition) or ALD (atomic layer deposition) …
Rational development of guanidinate and amidinate based cerium and ytterbium complexes as atomic layer deposition precursors: synthesis, modeling, and …
Owing to the limited availability of suitable precursors for vapor phase deposition of rare‐
earth containing thin‐film materials, new or improved precursors are sought after. In this …
earth containing thin‐film materials, new or improved precursors are sought after. In this …
Low temperature epitaxial oxide ultrathin films and nanostructures by atomic layer deposition
Highly epitaxial and pure (001) CeO2 ultrathin films have been prepared by atomic layer
deposition (ALD) at 275° C on Y-stabilized ZrO2 cubic fluorite single crystal substrate using …
deposition (ALD) at 275° C on Y-stabilized ZrO2 cubic fluorite single crystal substrate using …
Nano ceria as xylene sensor–Role of cerium precursor
DK Subbiah, AJ Kulandaisamy, RB George… - Journal of Alloys and …, 2018 - Elsevier
Cerium oxide (CeO 2) thin films were deposited on glass substrates by spray pyrolysis
technique using three different precursors namely cerium chloride heptahydrate, cerium …
technique using three different precursors namely cerium chloride heptahydrate, cerium …