The development and understanding of elastohydrodynamic lubrication (EHL) can be traced
back to the beginning of the previous century. However, it was not until 1949 that the first …

Nanoceria redox properties are affected by particle size, particle shape, surface chemistry,
and other factors, such as additives that coat the surface, local pH, and ligands that can …

In this study, two diamond wheels are newly developed. A novel approach of mechanical
chemical grinding (MCG) is proposed using the diamond wheel (C2) with ceria (CeO 2) …

Abstract Ce 3+ in CeO 2, rather than Ce 4+, is believed to provide assistance to the breaking
up of Sisingle bondO bond during chemical mechanical polishing (CMP) of silica. In the …

To address the problem of low polishing efficiency in traditional loose-abrasive chemical
mechanical polishing, a humidity-controlled fixed-abrasive chemical mechanical polishing …

In this work, we theoretically investigated the friction mechanism of hexagonal MoS2 (a well-
known lamellar compound) using a computational chemistry method. First, we determined …

In this work, the atomic mechanism of tribochemical wear of silicon at the Si/SiO 2 interface
in aqueous environment was investigated using ReaxFF molecular dynamics (MD) …

Reactive molecular dynamics simulations have been used to simulate the chemical
mechanical polishing (CMP) process of silica glass surfaces with the ceria (111) and (100) …

In this work, the friction anisotropy of hexagonal MoS2 (a well-known lamellar compound)
was theoretically investigated. A molecular dynamics method was adopted to study the …

ReaxFF reactive molecular dynamics simulations are employed to study the process of the
silica abrasive particle sliding on the Si (1 0 0) substrate in the aqueous H 2 O 2 in order to …