Origin of photoluminescence in nanocrystalline Si: H films

AM Ali - Journal of luminescence, 2007 - Elsevier
We have studied the origin of photoluminescence (PL) from hydrogenated nanocrystalline
silicon (nc-Si: H) films produced by a plasma-enhanced chemical vapor deposition …

Hierarchical inorganic nanopatterning (INP) through direct easy block-copolymer templating

M Kuemmel, JH Smått, C Boissière, L Nicole… - Journal of Materials …, 2009 - pubs.rsc.org
We introduce a simple route towards hierarchical TiO2 nanopatterns using a block-
copolymer template approach combined with a dip-coating process and soft inorganic …

Integration of tunnel-coupled double nanocrystalline silicon quantum dots with a multiple-gate single-electron transistor

Y Kawata, MAH Khalafalla, K Usami… - Japanese Journal of …, 2007 - iopscience.iop.org
We report on integration of double nanocrystalline silicon quantum dots (nc-Si QDs) of
approximately 10 nm in diameter onto the multiple-gate single-electron transistor (SET) used …

Removal of surface oxide layer from silicon nanocrystals by hydrogen fluoride vapor etching

Y Nakamine, T Kodera, K Uchida… - Japanese journal of …, 2011 - iopscience.iop.org
We describe the natural oxidation of silicon nanocrystals (SiNCs) and the method of etching
the natural oxide layer of SiNC with hydrogen fluoride (HF) vapor. Electrical measurements …

Synthesis of Assembled Nanocrystalline Si Dots Film by the Langmuir–Blodgett Technique

A Tanaka, Y Tsuchiya, K Usami, S Saito… - Japanese journal of …, 2008 - iopscience.iop.org
We report on a new bottom-up technique for forming silicon nanostructures based on the
assembly of nanocrystalline Si (nc-Si) dots by the Langmuir–Blodgett technique. nc-Si dots …

Ab initio study of electronic structures of InAs and GaSb nanowires along various crystallographic orientations

WF Sun, MC Li, LC Zhao - Computational materials science, 2010 - Elsevier
InAs and GaSb nanowires oriented along different crystallographic axes—the [001],[101]
and [111] directions of zinc-blende structure—have been studied utilizing a first-principles …

Fabrication of nanosilicon ink and two-dimensional array of nanocrystalline silicon quantum dots

T Ishikawa, H Nikaido, K Usami… - Japanese journal of …, 2010 - iopscience.iop.org
An assembly of nanoparticles using a colloidal solution is promising for the fabrication of
future highly integrated electron and photoelectronic devices because of low manufacturing …

Numerical simulation study of electrostatically defined silicon double quantum dot device

MA Sulthoni, T Kodera, K Uchida, S Oda - Journal of Applied Physics, 2011 - pubs.aip.org
Coupled quantum dots are of great interest for the application of quantum computing. The
aspect needing attention is the preparation of well-defined quantum dots with small sizes …

Quantum dot devices: Technology vehicles for nanoscale physics and paths for future applications

S Oda - 2016 46th European Solid-State Device Research …, 2016 - ieeexplore.ieee.org
As CMOS device scaling approaches to sub 10-nm node, quantum size effects become
significant even at room temperature. Recent progress in the fabrication technology of …

Characterization of electroluminescence from one-dimensionally self-aligned si-based quantum dots

H Takami, K Makihara, M Ikeda… - Japanese Journal of …, 2013 - iopscience.iop.org
We have demonstrated self-assembling formation of one-dimensionally self-aligned Si-
based quantum dots (QDs) structures and applied them to an active layer of light emitting …