Ultralow-Resistivity Molybdenum-Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-Based Precursor
MJ Ha, H Kim, JH Choi, M Kim, WH Kim… - Chemistry of …, 2022 - ACS Publications
As memory devices become ultraminiaturized, the increase in the resistance of the metal
line due to the decrease in the line width has become a very critical issue. Mo-based …
line due to the decrease in the line width has become a very critical issue. Mo-based …
A Volatile Dialane Complex from Ring Expansion of an N-Heterocyclic Carbene and Its Use in the Thermal Atomic Layer Deposition of Aluminum Metal Films
KJ Blakeney, PD Martin, CH Winter - Organometallics, 2020 - ACS Publications
Treatment of the stable N-heterocyclic carbene 1, 3-di-tert-butylimidazolin-2-ylidene with 2
equiv of AlH3 (NMe3) afforded the structurally unusual ring-expanded dialane complex 1 in …
equiv of AlH3 (NMe3) afforded the structurally unusual ring-expanded dialane complex 1 in …
Density functional theory study on the reducing agents for atomic layer deposition of tungsten using tungsten chloride precursor
R Hidayat, T Chowdhury, Y Kim, S Kim… - Applied Surface …, 2021 - Elsevier
We studied co-reactants for tungsten chloride precursors by density functional theory
calculation to find the proper reducing agent. Tungsten chlorides, WCl 6 and WCl 5, are …
calculation to find the proper reducing agent. Tungsten chlorides, WCl 6 and WCl 5, are …
Synthesis Of Molybdenum Containing Thin Films Using Organic Reducing Agents And Synthesis Of Magnesium Silyl Intermediate Complexes For Use In Atomic Layer …
MD Overbeek - 2022 - search.proquest.com
Thin films of a variety of materials have shown great potential in the fields of
microelectronics, catalysis, and energy applications. Vapor deposition methods, including …
microelectronics, catalysis, and energy applications. Vapor deposition methods, including …