Physical mechanisms of negative-bias temperature instability

L Tsetseris, XJ Zhou, DM Fleetwood… - Applied Physics …, 2005 - pubs.aip.org
We report first-principles calculations that elucidate the mechanisms that underlie key
features of negative-bias temperature instability (NBTI). We show that the depassivation of Si …

Interface trap generation and hole trapping under NBTI and PBTI in advanced CMOS technology with a 2-nm gate oxide

M Denais, V Huard, C Parthasarathy… - … on Device and …, 2004 - ieeexplore.ieee.org
This paper gives an insight into the degradation mechanisms during negative and positive
bias temperature instabilities in advanced CMOS technology with a 2-nm gate oxide. We …

Positive Bias Temperature Instability and Hot Carrier Degradation of Back-End-of-Line, nm-Thick, In2O3 Thin-Film Transistors

YP Chen, M Si, BK Mahajan, Z Lin… - IEEE Electron …, 2021 - ieeexplore.ieee.org
Recently, back-end-of-line (BEOL) compatible indium oxide (In 2 O 3) thin-film transistors
(TFTs), grown by atomic layer deposition (ALD) with channel thickness of~ 1 nm and …

Bias-temperature instabilities of polysilicon gate HfO/sub 2/MOSFETs

K Onishi, R Choi, CS Kang, HJ Cho… - … on Electron Devices, 2003 - ieeexplore.ieee.org
Bias-temperature instabilities (BTI) of HfO/sub 2/metal oxide semiconductor field effect
transistors (MOSFETs) have been systematically studied for the first time. NMOS positive BTI …

Performance, reliability, radiation effects, and aging issues in microelectronics–From atomic-scale physics to engineering-level modeling

ST Pantelides, L Tsetseris, MJ Beck, SN Rashkeev… - Solid-State …, 2010 - Elsevier
The development of engineering-level models requires adoption of physical mechanisms
that underlie observed phenomena. This paper reviews several cases where parameter …

[HTML][HTML] Reliability-aware resource management in multi-/many-core systems: A perspective paper

SS Sahoo, B Ranjbar, A Kumar - Journal of Low Power Electronics and …, 2021 - mdpi.com
With the advancement of technology scaling, multi/many-core platforms are getting more
attention in embedded systems due to the ever-increasing performance requirements and …

Bias-temperature instabilities and radiation effects in MOS devices

XJ Zhou, DM Fleetwood, JA Felix… - … on Nuclear Science, 2005 - ieeexplore.ieee.org
We report the combined effects of irradiation and bias temperature stress (BTS) on MOS
capacitors with HfO/sub 2/dielectrics. Irradiation is found to enhance BTS-induced …

Investigation of trap-induced performance degradation and restriction on higher ferroelectric thickness in negative capacitance FDSOI FET

C Garg, N Chauhan, A Sharma… - … on Electron Devices, 2021 - ieeexplore.ieee.org
Bias Temperature Instability (BTI) has always been a critical reliability issue in a field effect
transistor (FET). In a negative capacitance (NC) FET, a study of BTI with considering the …

Hydrogen in MOSFETs–A primary agent of reliability issues

ST Pantelides, L Tsetseris, SN Rashkeev… - Microelectronics …, 2007 - Elsevier
Hydrogen plays an important role in MOSFETS as it is intentionally introduced to passivate
defects (primarily Si dangling bonds) at the Si–SiO2 interface. At the same time, hydrogen …

Simulation of statistical aspects of charge trapping and related degradation in bulk MOSFETs in the presence of random discrete dopants

MF Bukhori, S Roy, A Asenov - IEEE transactions on electron …, 2010 - ieeexplore.ieee.org
The distribution of fractional current change and threshold voltage shift in an ensemble of
realistic 35 nm bulk negative-channel metal-oxide-semiconductor field-effect transistors …