mm-Wave GaN-on-Si HEMTs with a PSAT of 3.9W/mm at 28GHz

R ElKashlan, A Khaled, S Yadav, H Yu… - 2023 IEEE/MTT-S …, 2023 - ieeexplore.ieee.org
We demonstrate GaN-on-Si HEMTs capable of meeting mm-wave requirements. We
compare the large-signal performance for thin barrier AlGaN/GaN and InAlN/GaN-based …

ESD failures of GaN-on-Si D-mode AlGaN/GaN MIS-HEMT and HEMT devices for 5G telecommunications

WM Wu, SH Chen, V Putcha, U Peralagu… - 2021 43rd Annual …, 2021 - ieeexplore.ieee.org
In this paper, Gallium Nitride (GaN) Metal-Insulator-Semiconductor (MIS)-HEMTs are
compared with conventional Schottky Metal-Semiconductor HEMTs in terms of DC and ESD …

Linearity assessment of GaN HEMTs on Si using nonlinear characterisation

R ElKashlan, A Khaled, R Rodriguez… - 2021 16th European …, 2022 - ieeexplore.ieee.org
We investigate the effect of varying the gate-to-drain spacing and the gate field-plate on the
device linearity of GaN HEMTs on Si for 0.11 μm, 0.15 μm, and 0.19 μm gate lengths. The …

RF linearity trade-offs for varying T-gate geometries of GaN HEMTs on Si

R ElKashlan, A Khaled, R Rodriguez… - International Journal of …, 2023 - cambridge.org
Short-channel Gallium Nitride (GaN) high-electron-mobility transistors (HEMTs) often utilize
T-shape gates due to their large gate-line cross-sectional area and subsequent fMAX …

GaN High‐Electron‐Mobility Transistors with Superconducting Nb Gates for Low‐Noise Cryogenic Applications

MA Mebarki, R Ferrand-Drake Del Castillo… - … status solidi (a), 2023 - Wiley Online Library
The successful integration of superconducting niobium (Nb) gate electrodes into cryogenic
gallium nitride (GaN)‐based high‐electron‐mobility transistors (HEMTs) is reported. This is …

Transistor GaN sur Si 200mm compatible CMOS pour l'amplification de puissance en bande Ka: optimisation de l'empilement de grille

A Chanuel - 2022 - theses.hal.science
La brique de grille des transistors GaN nécessite un dimensionnement plus compact avec
une longueur plus courte (Lg~ 150 nm) et une barrière plus fine (< 10 nm) pour le …

RF ESD Exploration in Si/III-V Heterogeneous Integration for 5G/B5G Applications

WM Wu, G Groeseneken, MD Ker - 2022 - lirias.kuleuven.be
When moving to the 5G telecommunication era, higher data rate and thus higher bandwidth
are the main requirements to enable this evolution. For RF ESD protection design in …

[PDF][PDF] GaN-on-Si Technology for Modern Wireless Communication Systems: Optimisation Insight Using RF Characterisation

SPDIP Wambacq, IB Parvais, IW Meulebroeck… - researchportal.vub.be
De stijgende complexiteit van onze moderne communicatiesystemen heeft een optimalisatie
te weeg gebracht voor elke specifieke functie op zich, en dit voor elke technologie …

Transistors with source-connected field plates

C Zhu, B Grote, BMR Green - US Patent 12,148,820, 2024 - Google Patents
Placement of a field plate in a field-effect transistor is optimized by using multiple dielectric
layers such that a first end of field plate is separated from a channel region of the transistor …